Dynamic magnetic field self-sharpening finishing device for flexible magnetorheological finishing pad and finishing method for dynamic magnetic field self-sharpening finishing device

Abstract

The invention relates to a dynamic magnetic field self-sharpening finishing device for a flexible magnetorheological finishing pad and a finishing method for the dynamic magnetic field self-sharpening finishing device. The dynamic magnetic field self-sharpening finishing device comprises a finishing disk revolution mechanism and a multi-magnetic-pole synchronous rotation driving mechanism, wherein the finishing disk revolution mechanism comprises a driving shaft motor, a drive shaft, an adapting disk, an eccentric shaft fixing disk, a cup-like finishing disk and a driving shaft transmission mechanism; the multi-magnetic-pole synchronous rotation driving mechanism comprises an eccentric spindle, synchronous rotation driving plates, flexible eccentric rotating shafts, eccentric sleeves, magnetic poles, the eccentric shaft fixing disk, a spindle motor and the like. According to the finishing device and the finishing method disclosed by the invention, the conditions that a circulating device is adopted for updating magnetorheological fluid and the magnetorheological fluid is changed in the processing process are avoided, so that the space is saved, and the whole process from rough finishing to fine finishing can be realized by one-time processing; obtained workpieces are good in surface consistency, high in processing efficiency, free from of surface and subsurface damage and low in cost, so the finishing device and the finishing method are suitable for high-efficiency ultra-smooth uniform finishing processing of planes of large-diameter optical elements; meanwhile, the finishing device and the finishing method disclosed by the invention are also suitable for experimental researches such as a material removing mechanism and subsurface damage detection of optical planar materials.

Description

technical field [0001] The invention relates to a dynamic magnetic field self-sharpening polishing device for a magnetorheological flexible polishing pad and a polishing method thereof, which is particularly suitable for flattening processing of optoelectronic / microelectronic semiconductor substrates and optical elements, and belongs to the technical field of ultra-precision processing. Background technique [0002] Optical components (lenses, mirrors) are one of the core components of optical devices. In order to achieve good optical performance, the surface precision needs to be ultra-smooth (roughness Ra should be below 1nm), and the surface shape precision also has high requirements ( The shape accuracy reaches below 0.5 microns). In the LED field, single crystal silicon (Si), single crystal germanium (Ge), gallium arsenide (GaAs), single crystal silicon carbide (SiC) and sapphire (Al 2 o 3 ) etc., as semiconductor substrate materials, also require an ultra-flat and ul...

AI Technical Summary

Problems solved by technology

However, when using the magnetorheological polishing method to process flat workpieces, various types of magnetorheological machine tools developed by the U.S. QED company are mainly used. The principle is to place the workpiece above an arc-shaped polishing disc, and the surface of the workpiece and the polishing disc In the concave gap formed between them, an electromagnet pole or permanent magnet pole with adjustable magnetic induction intensity is arranged under the polishing disc to form a high-intensity gradient magnetic field in the concave gap. When the magnetorheological fluid moves with the polishing disc to the workpiece and the polishing disc The flexible raised "polished ribbon" formed near the formed gap, but the "polished ribbon" is in partial contact with the surface of the workpiece as "spots", and the only way to control the "spots" along the surface of the workpiece in a certain regular trajectory during processing Scanning can realize the processing of the entire surface, and the trajectory scanning process takes a lot of time, resulting in low efficiency and difficult to guarantee the accuracy of the processing shape

[0004] In order to improve the polishing efficiency of magnetorheology, the patent CN200610132495.9 proposes a magnetorheological effect-based grinding and polishing method and its polishing device based on the principle of magnetorheological polishing and the mechanism of cluster action, and has carried out a large number of experimental studies. Method Although the surface domain polishing pad is formed by the cluster method, the processing uniformity of the workpiece is difficult to solve. After in-depth analysis, due to the viscoelasticity of the magnetorheological fluid, the workpiece will be raised after passing through the patented magnetorheological polishing pad. The flexible polishing pad is pressed down and cannot be recovered, thus losing the pressure on the workpiece, which makes the material removal rate of the edge of the workpiece and other areas very different, and the abrasive is difficult to renew in the viscoelastic polishing pad, which further reduces the processing effect ( figure 1 shown)

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