Electroplate liquid and electroplate method for gelatin cyanide-free plated Cu-Sn alloy
An electroplating solution, cu-sn technology, applied in the field of copper-tin electroplating, can solve problems such as restricting the promotion of cyanide-free electroplating copper-tin, poor quality of the plating layer, poor performance of the plating solution, etc., and achieve excellent performance of the plating solution and high brightness , the effect of good coating quality
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Embodiment 1
[0030] The formulation of the electroplating solution is as follows:
[0031]
[0032]
[0033] Plating process conditions: the pulse width of single pulse square wave current is 0.5ms, the duty cycle is 30%, and the average current density is 1A / dm 2 ; The pH is 8, the temperature is 50°C, and the electroplating time is 50min.
Embodiment 2
[0035] The formulation of the electroplating solution is as follows:
[0036]
[0037] Plating process conditions: the pulse width of single pulse square wave current is 0.6ms, the duty cycle is 25%, and the average current density is 1.2A / dm 2 ; The pH is 8.5, the temperature is 45°C, and the electroplating time is 45min.
Embodiment 3
[0039] The formulation of the electroplating solution is as follows:
[0040]
[0041] Plating process conditions: the pulse width of single pulse square wave current is 0.8ms, the duty cycle is 20%, and the average current density is 2A / dm 2 ; The pH is 9, the temperature is 30° C., and the electroplating time is 40 minutes.
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