Environment-friendly high-efficient silicon chip texturing agent and preparation method thereof
A kind of texturing agent and high-efficiency technology, which is applied in the field of environmental protection and high-efficiency silicon chip texturing agent and its preparation, can solve the problems of inability to realize fast and efficient texturing, large consumption of chemicals, poor repeatability of texturing, etc., and achieve degradable performance Good, reduce production cost and waste water treatment cost, improve the effect of stability
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment Construction
[0013] Non-limiting examples of the present invention are as follows:
[0014] An environment-friendly and high-efficiency silicon chip texturing agent is prepared from the following component raw materials by weight (kg):
[0015] Sodium Hydroxide 2.5, Sodium Cocoyl Methyl Taurate 1, Castor Oil Polyoxyethylene Ether 0.5, Hydroxyethylene Diphosphonic Acid 0.4, Sodium Polyacrylate 2, Sodium Oleate 0.5, Sodium Silicate 0.5, Texturing Conditioner 10, water 150;
[0016] Wherein the texturizing regulator is made of the following component raw materials by weight (kg): styrene 3, methyl methacrylate 2, polyvinyl alcohol 2, cornstarch 1, potassium persulfate 0.1, flat plus 0.5, water 80; The preparation method of the texture regulator is to add polyvinyl alcohol and corn starch to 1 / 2 amount of water and stir at 60°C for 1 hour, then add Pingpingjia and stir for 5 minutes at 1000r / min, add styrene, methyl methacrylate and potassium persulfate Mix well and heat to 85°C to react for...
PUM
Property | Measurement | Unit |
---|---|---|
size | aaaaa | aaaaa |
reflectance | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com