Sedimentation accelerating agent and application used for coating mechanically plated with copper and copper alloy
A technology for depositing accelerators and copper alloy layers, which is applied in the coating process and coating of metal materials. It can solve the problems of easy oxidation of metal copper and many standard electrode potentials, and achieve the effect of fast powder application and uniform color.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0017] The composition and weight percentage of the deposition accelerator for the mechanical copper plating and copper alloy layer in this embodiment are:
[0018] Diatomite 0.5%
[0019] Sodium gluconate 1%
[0020] Triethanolamine 0.5%
[0021] Stannous chloride 40%
[0022] Ammonium dihydrogen phosphate 1%
[0023] OP-106%
[0024] Sulfuric acid 1%
[0025] Water 50%
[0026] The above raw materials are all industrial grade chemical raw materials, and the water is clean tap water.
[0027] The deposition accelerator for mechanical copper plating and copper alloy plating in this embodiment is used for mechanical copper and copper alloy plating on the surface of steel parts. The steel parts to be plated are 100kg Ф20 flat gaskets with a thickness of 3mm and a surface area of 9.5 square meters. Prepare the deposition accelerator aqueous solution according to the above raw materials and their weight percentages (first add sulfuric acid to the water, then add OP-10, and finally add other c...
Embodiment 2
[0029] The composition and weight percentage of the deposition accelerator for the mechanical copper plating and copper alloy layer in this embodiment are:
[0030] Diatomite 1%
[0031] Sodium gluconate 2%
[0032] Triethanolamine 1%
[0033] Stannous sulfate 45%
[0034] Ammonium dihydrogen phosphate 3%
[0035] OP-108%
[0036] Phosphoric acid 1%
[0037] Water 39%
[0038] The above raw materials are all industrial grade chemical raw materials, and the water is clean tap water.
[0039] The deposition accelerator for mechanical copper plating and copper alloy plating in this embodiment is used for mechanical copper and copper alloy plating on the surface of steel parts. The steel parts to be plated are 100kg Ф16 flat gaskets with a thickness of 2mm and a surface area of 14 square meters. Prepare the deposition accelerator aqueous solution according to the above raw materials and their weight percentages (first add phosphoric acid to the water, then add OP-10, and finally add other che...
Embodiment 3
[0041] The composition and weight percentage of the deposition accelerator for the mechanical copper plating and copper alloy layer in this embodiment are:
[0042] Diatomaceous earth 0.6%
[0043] Sodium gluconate 1.4%
[0044] Triethanolamine 0.8%
[0045] Stannous sulfate 35%
[0046] Ammonium dihydrogen phosphate 2.4%
[0047] OP-105%
[0048] Sulfuric acid 1.5%
[0049] Water 53.3%
[0050] The above raw materials are all industrial grade chemical raw materials, and the water is clean tap water.
[0051] The deposition accelerator for mechanical copper plating and copper alloy plating in this embodiment is used for mechanical copper and copper alloy plating on the surface of steel parts. The steel parts to be plated are 100kg of iron nails with a length of Ф2.5mm and a length of 50mm. The surface area to be plated is 22.5. ㎡. Prepare the deposition accelerator aqueous solution according to the above raw materials and their weight percentages (first add sulfuric acid to the water, then...
PUM
Property | Measurement | Unit |
---|---|---|
thickness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com