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Flash deposition apparatus

A deposition device and flash evaporation technology, applied in vacuum evaporation plating, ion implantation plating, gaseous chemical plating, etc., can solve the problems of uneven heating, low productivity of production equipment, waste of materials, etc., and achieve high material utilization rate , Improve the effect of thickness control

Inactive Publication Date: 2015-11-25
AOYV NEW MATERIAL TECH (JIAXING)
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  • Summary
  • Abstract
  • Description
  • Claims
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AI Technical Summary

Problems solved by technology

Another disadvantage of conventional crucibles is that the heating of bulk organic materials is often uneven
Furthermore, conventional thin film deposition systems cannot vaporize mixed materials with different evaporation temperatures in a controllable manner and maintain the desired composition in the deposited film
[0005] Another major disadvantage of conventional evaporation units is that they require long periods of time to heat large amounts of material and waste a large amount of material during evaporation preparation stages such as "preheating" or "drying"
Evaporation preparation and material removal also waste time and effort, which leads to lower productivity of production equipment

Method used

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Embodiment Construction

[0023] refer to figure 2 , the flash deposition apparatus 200 includes a substrate 210 , a shower head 230 , one or more evaporation heaters 240 , one or more radiation shields 220 , and a liquid material delivery device 250 . Each liquid material delivery device 250 can eject small liquid droplets with precise volume control and repeatability as required. The droplets pass through one or more apertures in the radiation shield 220 to the vicinity of the evaporation heater 240, where the droplets are evaporated to produce a vapor. The vapor generated by the evaporation heater 240 passes through the small holes on the shower head 230 having a plurality of small holes. The showerhead 230 ensures that the evaporated material reaches the substrate 210 evenly to form a thin film on the substrate 210 with a well-defined distribution and desired deposition uniformity. The film can be in liquid or solid phase, physically deposited or formed by chemical reaction. The substrate 210 c...

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Abstract

A flash deposition apparatus includes a liquid delivery system configured to produce fine liquid droplets of an organic material, a heater configured to vaporize the fine liquid droplets to produce a vapor material to be directed to a substrate on which the organic material is deposited; and a radiation shield configured to shield the heater from the liquid delivery system.

Description

technical field [0001] The present invention relates to material deposition technology, in particular to organic material deposition. Background technique [0002] Conventional thin film deposition systems for organic materials usually employ point or linear thermal evaporation sources, which are fabricated into crucibles. Examples of organic materials include monomers, oligomers, precursors, polymers or other raw materials. In a conventional evaporation process, the organic material is heated and stored in a crucible at high temperature for a long time (hours to weeks) before being deposited on a substrate. The organic materials are typically heated unevenly within conventional crucibles, which causes the process to deviate from ideal conditions. The lack of precise process control leads to compositional variations of the deposited films, and degradation or decomposition of organic materials. For example, during the fabrication of organic light-emitting diodes (OLEDs), p...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/12C23C14/24
CPCC23C14/54C23C14/24C23C14/246C23C16/4486
Inventor 王开安孙静茹黄仲漩
Owner AOYV NEW MATERIAL TECH (JIAXING)
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