Waveguide butt-coupling type separated absorption multiplication avalanche diode
An avalanche diode, butt coupling technology, applied in semiconductor devices, electrical components, circuits, etc., to reduce transit time and dark current, improve sensitivity, and avoid disturbances.
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[0016] As shown in Figure 3, its preparation process and method are as follows:
[0017] 1. Etching the ridge waveguide 110 on the top layer of 220nm thick Si of a silicon-on-insulator (SOI) substrate with an etching depth of 120nm.
[0018] 2. Define the device area by etching and etch to the insulating buried layer.
[0019] 3. Boron is implanted to form a p-type charge region 104 with a doping concentration of 2×10 17 cm -3 ;
[0020] 4. Deposit a layer of SiO on the surface 2 , a Ge epitaxial window is etched by a combination of dry and wet methods, and the intrinsic Ge layer is epitaxially selected, with a thickness of about 0.5 μm;
[0021] 5. Implant boron in the top layer of Ge region to form p + The ohmic contact layer 102 has a thickness of about 0.1 μm and a doping concentration of 1×10 19 cm -3 , and the remaining part is the Ge absorbing layer 103;
[0022] 6. Phosphorus ion implantation forms n + Ohmic contact region 107, the doping concentration is 1×10...
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