Method for modifying surfaces of biodegradable magnesium and magnesium alloy through titanium ion implantation and deposition
A biodegradation and ion implantation technology is applied in the field of surface modification of biodegradable magnesium and magnesium alloys by titanium ion implantation and deposition, which can solve the problems of limiting the thickness of the modified layer, accelerating corrosion, etc. The effect of improving and reducing self-corrosion current
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Embodiment 1
[0032] The first step: substrate pretreatment:
[0033] After the ZK60 magnesium alloy substrate was mechanically polished, it was ultrasonically cleaned with acetone and absolute ethanol for 10 minutes to prepare the substrate sample;
[0034] The second step: ion implantation to prepare mixed oxide transition layer:
[0035] The substrate obtained in the first step is doped with titanium element to obtain a sample with a mixed oxide transition layer; the ion implantation deposition composite coating machine selects commercial pure titanium as the target material, and the parameters required for doping titanium element : Vacuum degree 5×10 -3 Pa, titanium ion implantation dose 5×10 16 ions / cm 2 , voltage energy 10keV, current 3mA;
[0036] The third step: Ion beam enhanced deposition technology to prepare the surface titanium film:
[0037] The substrate obtained in the second step is subjected to titanium thin film deposition, the target material is commercially pure ti...
Embodiment 2
[0046] The first step: substrate pretreatment:
[0047] After the matrix of bioactive magnesium alloy Mg-X (X=any one of Zn, Zr, Sr, and Ca) is mechanically polished, it is ultrasonically cleaned with acetone and absolute ethanol for 10 minutes to prepare the matrix sample;
[0048] The second step: ion implantation to prepare mixed oxide transition layer:
[0049] The substrate obtained in the first step is doped with titanium element to obtain a sample with a mixed oxide transition layer; the ion implantation deposition composite coating machine selects commercial pure titanium as the target material, and the parameters required for doping titanium element : Vacuum degree 5×10 -3 Pa, titanium ion implantation dose 1×10 17 ions / cm 2 , voltage energy 12keV, current 3mA;
[0050] The third step: Ion beam enhanced deposition technology to prepare the surface titanium film:
[0051] The substrate obtained in the second step is subjected to titanium thin film deposition, the ...
Embodiment 3
[0054] The first step: substrate pretreatment:
[0055] After the pure magnesium matrix was mechanically polished, it was ultrasonically cleaned with acetone and absolute ethanol for 10 minutes to prepare the matrix sample;
[0056] The second step: ion implantation to prepare mixed oxide transition layer:
[0057] The substrate obtained in the first step is doped with titanium element to obtain a sample with a mixed oxide transition layer; the ion implantation deposition composite coating machine selects commercial pure titanium as the target material, and the parameters required for doping titanium element : Vacuum degree 1×10 -3 Pa, titanium ion implantation dose 8×10 16 ions / cm 2 , voltage energy 10keV, current 2.5mA;
[0058] The third step: Ion beam enhanced deposition technology to prepare the surface titanium film:
[0059] The substrate obtained in the second step is subjected to titanium thin film deposition, the target material is commercially pure titanium, an...
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