Vanadium dioxide powder preparation method and application thereof

Abstract

The invention provides a vanadium dioxide powder preparation method. The method comprises the steps that 1, N2H4.2HCl and H2CO4.2H2O are adopted in a hydrochloric acid medium for reducing vanadium pentoxide to obtain a VOCL2 solution; 2, the VOCL2 solution reacts with (NH4)2CO3 to obtain an alkaline-mode vanadyl ammonium carbonate precursor; 3, the obtained precursor is ultrasonically broken in absolute ethyl alcohol to achieve the granularity being smaller than 2 micrometers, the product is placed into a furnace with nitrogen to be heated and decomposed, and then vanadium dioxide powder is obtained, wherein when the product is heated and decomposed in the step 3, the nitrogen flow speed is 15 ml / min, and the temperature increasing speed is 5 DEG C / min.

Description

technical field [0001] The invention relates to the field of metal powder synthesis, in particular to a method for preparing vanadium dioxide powder with a more stable process. Background technique [0002] Vanadium dioxide is a material with phase change properties. A thermally induced reversible semiconductor-metal phase transition will occur around 70°C. Based on this feature, it is used in energy-saving windows, thermal switches, laser protection, and infrared heat. Imaging has a wide range of application prospects. Vanadium dioxide powder material has the obvious advantages of low cost and high production efficiency, and it can also develop a new process for preparing vanadium dioxide film based on powder material after the powder material preparation process becomes mature, which will realize Ways to widely use vanadium. The fine-grained vanadium dioxide powder will significantly reduce the stress during the phase transition of the material, and with the decrease of ...

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Problems solved by technology

[0003] At present, the research on the preparation process of vanadium dioxide mainly focuses on the preparation of thin films, and the preparation of powders is relatively rare. Chemical methods such as chemical bath method, pulling method or reaction sputtering are usually used for vanadium dioxide thin films. However, these processes generally have limitations such as expensive equipment, complex control of process parameters, and low deposition rate; in Chinese patents CN104030355A and CN102115167A, the method of synthesizing vanadium dioxide powder is mostly using alkaline reagents

In the method for preparing vanadium dioxide provided in the patent CN1451633A, vanadium pentoxide is reduced with oxalic acid, hydrazine, etc. in hydrochloric acid medium, and then thermally decomposed after crushing. The heating temperature is 350~700°C. There are differences in endothermic and exothermic reactions in the stage, and the heating temperature in this method will lead to poor product purity and low reaction efficiency

In summary, the existing preparation methods are ultimately poor in process stability and repeatability, and are not suitable for mass production requirements.

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