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Waste residue comprehensive utilization method for trichlorosilane leaching system

A technology of trichlorosilane shower and waste residue, which is applied in solid waste management, alkali metal chloride, sustainable waste treatment, etc., can solve the problems of substandard products, unfavorable brick and cement production, etc. Socioeconomic benefits, the effect of avoiding the reduction of purity

Active Publication Date: 2015-03-25
河南尚宇新能源股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, the presence of chloride ions and sodium chloride in the waste residue is not conducive to the production of bricks and cement, and the prepared products are not up to standard

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] (1) Formation of waste slag in the leaching system: The waste and unreacted parts generated during the production of trichlorosilane enter the rinsing system, undergo alkaline hydrolysis, sodium hydroxide rinsing and absorption, and neutralize in the rinsing pool To form waste residue, when the thickness of the waste residue settled at the bottom of the pool is 50cm, use a plate and frame filter press to filter and separate the leaching waste residue, and the filter press filtrate is returned to the leaching tank for recycling and recycling;

[0026] The separated leaching waste residue has a pH value of 10 and a moisture content of 50%; its main components are sodium metasilicate, silicon dioxide, silicon powder, ferric hydroxide, calcium hydroxide, calcium silicate, aluminum hydroxide, metasilicate Sodium aluminate, sodium aluminosilicate, sodium chloride and a small amount of insoluble mechanical impurities. Among them, calcium raw materials, silicon raw materials, a...

Embodiment 2

[0034] (1) The same parts as in Embodiment 1 will not be repeated;

[0035] The different parts are: the thickness of the waste residue settled at the bottom of the leaching tank is 16cm; the leaching waste residue separated by plate and frame filter press has a pH value of 9 and a moisture content of 30%;

[0036] (2) Beating: use a forklift to put the leaching waste residue obtained in step (1) into the drum mixer, add tap water according to the mass ratio of leaching waste residue to water 1:1 for stirring, and obtain slurry;

[0037] (3) Redissolution: Put the slurry obtained in step (2) into the dissolution tank by using the high potential difference, add tap water according to the ratio of slurry to water mass ratio of 1:0.5, stir and dissolve with a mechanical stirrer for 1.5 hours, fully After dissolution, the concentration of sodium chloride reaches 15%, and then industrial hydrochloric acid is added to adjust to PH=8 to obtain a feed liquid;

[0038] (4) Separation ...

Embodiment 3

[0043] (1) The same parts as in Embodiment 1 will not be repeated;

[0044] The different parts are: the thickness of the waste residue settled at the bottom of the leaching tank is 30cm; the leaching waste residue separated by plate and frame filter press has a pH value of 9.5 and a moisture content of 40%;

[0045] (2) Beating: use a forklift to put the leaching waste residue obtained in step (1) into the drum mixer, add tap water according to the mass ratio of leaching waste residue to water 2:1 for stirring, and obtain slurry;

[0046] (3) Redissolving: put the slurry obtained in step (2) into the dissolving tank by using the high head difference, add tap water in a ratio of 1:1 mass ratio of slurry to water, stir and dissolve for 2 hours by a mechanical stirrer, After fully dissolving, the sodium chloride concentration reaches 20%, and then industrial hydrochloric acid is added to adjust to PH=7 to obtain a feed liquid;

[0047] (4) Separation of insoluble residues: The fe...

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Abstract

The invention discloses a waste residue comprehensive utilization method for a trichlorosilane leaching system. The waste residue comprehensive utilization method comprises the following steps: filter pressing a leaching waste residue mixed solution formed by the leaching system by using a filter press to obtain leaching waste residue; putting the leaching waste residue into a drum mixer, adding an appropriate amount of tap water, and stirring to obtain a slurry; discharging the slurry to a dissolving tank by utilizing a high potential difference, adding the appropriate amount of the tap water, mechanically stirring to dissolve for 1.5-4 hours, and obtaining a feed liquid containing sodium chloride; filter pressing the feed liquid to obtain insoluble residue and filtrate, storing the insoluble residue for later use, performing secondary refined filtration on the obtained filtrate, injecting a refined filtration mother liquid into a double-effect evaporator through a centrifugal pump to evaporate and crystallize, and obtaining a finished product, sodium chloride with the purity of more than 99%. According to the waste residue comprehensive utilization method for the trichlorosilane leaching system, soluble salt and insoluble salt are effectively separated, and a purpose of recycling leaching waste residue in a classifying manner is achieved; the environment pollution and the wasting of resources are reduced, and the economic benefits are increased.

Description

technical field [0001] The invention belongs to the technical field of chemical waste treatment, and in particular relates to a method for comprehensive utilization of waste residue in a trichlorosilane rinsing system. Background technique [0002] In the process of trichlorosilane production, a large amount of waste water, waste gas and waste residue will be produced. If not treated in time and effectively, it will cause serious pollution to the surrounding environment. In the polysilicon and trichlorosilane production industry, there are waste water and waste gas treatment equipment and processes, but their comprehensive utilization rate is low and rarely involves the treatment of solid waste residues. The problem of solid waste residue treatment has always been a difficult point , it is difficult to achieve harmlessness. [0003] In the production process of trichlorosilane, unreacted silicon powder and solid impurities, waste residue containing chlorosilane, waste liqui...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01D3/04C04B7/24C04B18/04B09B3/00
CPCY02P40/10Y02W30/91
Inventor 时智宝常成圣赵建桥陈建祥王国正
Owner 河南尚宇新能源股份有限公司
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