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Preparation method of titanium-aluminum-silicon alloy target

A technology of alloy target, titanium-aluminum-silicon, which is applied in the field of preparation of titanium-aluminum-silicon alloy target, which can solve the problem of difficulty in obtaining high-quality and high-density targets, large-size difficult targets, and uneven relative density of hot-pressed targets and other problems, to achieve the effects of fine grain size, improved powder utilization rate and high density

Active Publication Date: 2019-03-19
ADVANCED TECHNOLOGY & MATERIALS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the size of the target produced by the vacuum hot-pressing process is limited by the size of the equipment, and it is difficult to achieve large-scale targets, and the relative density inside the hot-pressed target is not uniform, and there is a large difference between the middle and edge densities, making it difficult to obtain high-quality and high-density targets. material

Method used

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  • Preparation method of titanium-aluminum-silicon alloy target

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0024] The titanium-aluminum-silicon alloy target provided in this embodiment is composed of the following atomic percentages: 50% titanium, 40% aluminum, and 10% silicon.

[0025] The preparation method of the titanium-aluminum-silicon target in this example comprises the following steps:

[0026] Step 1: Weigh 63.8 parts of titanium powder with a purity of 99.6%, 28.8 parts of aluminum powder with a purity of 99.7%, and 7.4 parts of silicon powder with a purity of 99.9% according to the design requirements of the above-mentioned target material composition. Alloy powder with an average particle size of 40 μm (ie pre-alloyed powder);

[0027] The atomization powder making process is to use an arc melting method for metal melting, and an inert gas-metal atomization powder making method to prepare alloy powder;

[0028] Step 2, the obtained alloy powder is put into a cold isostatic pressing forming mold, and cold isostatic pressing is performed under a pressure of 200 MPa, and...

Embodiment 2

[0035] The titanium-aluminum-silicon alloy target provided in this embodiment is composed of the following atomic percentages: 9% titanium, 90% aluminum, and 1% silicon.

[0036] The preparation method of the titanium-aluminum-silicon target in this example comprises the following steps:

[0037] Step 1, according to the above design requirements of the target material composition, weigh 14.9 parts of titanium powder with an average particle size of 80 μm and a purity of 99.6%, 84.1 parts of aluminum powder with a purity of 99.7%, and 1 part of silicon powder with a purity of 99.9%, and weigh them in V Mixed in a type mixer for 3 hours, vacuumed for protection during the mixing process, and the vacuum degree was controlled at 10 -2 About Pa;

[0038] Step 2, put the mixed alloy powder into a cold isostatic pressing mold, and perform cold isostatic pressing under a pressure of 150 MPa, and the holding time is 10 minutes;

[0039] Step 3: Put the blank after cold isostatic pre...

Embodiment 3

[0045] The titanium-aluminum-silicon alloy target provided in this example is composed of the following atomic percentages, titanium 5%,

[0046] Aluminum 75%, silicon 20%.

[0047] The preparation method of the titanium-aluminum-silicon target in this example comprises the following steps:

[0048] Step 1, according to the design requirements of the above target material composition, weigh 8.5 parts of titanium powder with an average particle size of 150 μm and a purity of 99.7%, 71.7 parts of aluminum powder with a purity of 99.9%, and 19.8 parts of silicon powder with a purity of 99.9%, and weigh them in V Mix in a type mixer for 5 hours, and fill in high-purity argon for protection during the mixing process;

[0049] Step 2, put the mixed powder into a cold isostatic pressing mold for cold isostatic pressing, the cold isostatic pressing pressure is 200MPa, and the holding time is 20min;

[0050] Step 3, put the cold isostatic pressing billet into a metal sheath of approp...

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Abstract

The invention provides a preparation method for a titanium, aluminum and silicon alloy target. The method comprises the steps: alloy powder preparation, cold isostatic pressure treatment, degassing treatment, thermal isostatic pressure treatment and machining. The titanium, aluminum and silicon alloy target prepared by the preparation method disclosed by the invention has the advantages of high compactness, no gas hole and segregation, uniform tissue, small crystalline grain and the like, and is suitable for sputtering coating layers of various cutters and dies.

Description

technical field [0001] The invention relates to the technical field of powder metallurgy material preparation, in particular to a method for preparing a titanium-aluminum-silicon alloy target. Background technique [0002] Since the 1960s, after nearly half a century of development, tool surface coating technology has become the main method to improve tool performance. Tool surface coating mainly increases cutting speed and feed rate by improving tool surface hardness, thermal stability, and reducing friction coefficient, thereby improving cutting efficiency and greatly increasing tool life. [0003] Coating a layer of TiN, TiCN, TiAlN film layer on the surface of metal tools and mold materials to improve the wear resistance of tools and molds. At present, pure titanium or titanium aluminum alloy targets have been developed to prepare this film. Studies have shown that TiN, TiCN, TiAlN and other films prepared by using pure titanium or titanium-aluminum alloy targets can a...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B22F3/04B22F3/14C22C1/04C22C21/00C22C14/00C23C14/14C23C14/34
Inventor 周武平姚伟赵雷郝权张路长孙继洲
Owner ADVANCED TECHNOLOGY & MATERIALS CO LTD
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