Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A modification method for surface etching and bonding of β-cyclodextrin to membrane artificial lung by using low-temperature plasma

A technology of low-temperature plasma and surface etching, applied in chemical instruments and methods, membrane technology, semi-permeable membrane separation, etc., can solve problems such as uncontrollable influence of surface functionalization, random degradation and etching, etc., and achieve good biophase Effects of capacitive and anti-pollution performance, reduction of pure water contact angle, and improvement of biocompatibility

Active Publication Date: 2016-03-23
NANJING UNIV
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At the same time, low-temperature plasma chemical modification will inevitably lead to random degradation etching of the surface and chemical crosslinking of the surface, which will have a certain uncontrollable impact on the surface functionalization of the material.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A modification method for surface etching and bonding of β-cyclodextrin to membrane artificial lung by using low-temperature plasma
  • A modification method for surface etching and bonding of β-cyclodextrin to membrane artificial lung by using low-temperature plasma
  • A modification method for surface etching and bonding of β-cyclodextrin to membrane artificial lung by using low-temperature plasma

Examples

Experimental program
Comparison scheme
Effect test

specific Embodiment 1

[0028] (1) Clean the TPX membrane, and after vacuum drying, cover the surface with a layer of anodized aluminum template with a standard pore size. The pore size of the anodized aluminum template is 50 nm, the hole spacing is 100 nm, and the thickness is 50-70 μm. Put it into the substrate stage of the vacuum chamber of the plasma reactor, evacuate to 1Pa, then pass helium (He) until the pressure of the vacuum chamber reaches 10Pa, the irradiation time (etching time) is 200s, and the irradiation power is 150W. Stop the discharge, evacuate the vacuum chamber to 1Pa, and replace the gas in the vacuum chamber with nitrogen, repeat 2-3 times;

[0029] (2) Remove the aluminum oxide template on the surface of the TPX film, then fix it and put it into the substrate stage of the vacuum chamber of the plasma reactor, vacuumize to 1Pa, use oxygen (O 2 ) for surface activation, and the vacuum chamber pressure is 20Pa. The irradiation time is 20s, and the irradiation power is 150W. Stop...

specific Embodiment 2

[0031] (1) Clean the TPX membrane, and after vacuum drying, cover the surface with a layer of anodized aluminum template with standard pore size. The pore size of the anodized aluminum template is 200nm, the hole spacing is 500nm, and the thickness is 50-70μm. Put it into the substrate table of the vacuum chamber of the plasma reactor, evacuate to 1Pa, then pass helium (He) until the pressure of the vacuum chamber reaches 20Pa, the irradiation time (etching time) is 600s, and the irradiation power is 300W. Stop the discharge, evacuate the vacuum chamber to 1Pa, and replace the gas in the vacuum chamber with nitrogen, repeat 2-3 times;

[0032](2) Remove the aluminum oxide template on the surface of the TPX film, then fix it and put it into the substrate stage of the vacuum chamber of the plasma reactor, vacuumize to 1Pa, use oxygen (O 2 ) for surface activation, and the vacuum chamber pressure is 50Pa. The irradiation time is 120s, and the irradiation power is 200W. Stop the...

specific Embodiment 3

[0034] (1) Clean the TPX membrane, and after vacuum drying, cover the surface with a layer of anodized aluminum template with a standard pore size. The pore size of the anodized aluminum template is 50 nm, the hole spacing is 100 nm, and the thickness is 50-70 μm. Put it into the substrate stage of the vacuum chamber of the plasma reactor, evacuate to 1Pa, then pass argon (Ar) until the pressure of the vacuum chamber reaches 10Pa, the irradiation time (etching time) is 200s, and the irradiation power is 150W. Stop the discharge, evacuate the vacuum chamber to 1Pa, and replace the gas in the vacuum chamber with nitrogen, repeat 2-3 times;

[0035] (2) Remove the aluminum oxide template on the surface of the TPX film, then fix it and put it into the substrate stage of the vacuum chamber of the plasma reactor, vacuumize to 1Pa, use ammonia (NH 3 ) for surface activation, and the vacuum chamber pressure is 20Pa. The irradiation time is 20s, and the irradiation power is 150W. Sto...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a modification method for etching the surface of a membrane-type artificial lung and bonding beta-cyclodextrin by using low-temperature plasma. The method comprises the following steps that the poly(4-methyl-1-pentene) membrane-type artificial lung is used as a substrate, a roughened surface with standard pore diameter distribution is obtained by conducting etching through the low-temperature plasma by means of an alumina template with a standard pore diameter, and the beta-cyclodextrin is fixedly bonded to the roughened surface according to the low-temperature plasma activated grafting technology. Uniform surface etching is achieved by introducing the template with the standard pore diameter and pore diameter distribution, and therefore more active sites are produced while the specific surface area is enlarged. The template technology overcomes nonuniformity in substrate plasma modification in the prior art to a certain degree, the performance of a plasma modified film is controlled relatively stably, and the alumina template can be used repeatedly. The beta-cyclodextrin is bonded to the surface, so that surface biocompatibility of the membrane-type artificial lung is improved.

Description

technical field [0001] The invention relates to a modification method of a polymer membrane material used in a membrane-type artificial lung, in particular to a modification method of using low-temperature plasma to etch the surface of a membrane-type artificial lung and bonding beta-cyclodextrin. Background technique [0002] Membrane artificial lung, also known as membrane oxygenator or gas exchanger, its main function is to replace human lungs in the extracorporeal circulation of thoracotomy when the lungs of the body are diseased or damaged. CO 2 , at the same time intake of essential O 2 , to maintain the lives of patients with lung disease. [0003] For membrane artificial lungs, the core component is the membrane material, and its performance directly determines the oxygenation effect of the oxygenator. Compared with other artificial organs, the development of artificial lungs is obviously lagging behind. The main reason is that there is a lack of efficient membran...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): B01D67/00
Inventor 李磊黄鑫张志炳王伟平刘耀东
Owner NANJING UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products