Multilayer multielement high temperature resistant diamond-like nano composite thin film material
A nano-composite and thin-film material technology, applied in metal material coating process, coating, ion implantation plating, etc., can solve the problems of DLC film service life decline, DLC film is easy to be oxidized, and limit the wide application of films, etc., to achieve Improved friction and wear performance, increased operating temperature range, excellent friction and self-lubricating performance
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Embodiment 1
[0019] Take a 304 stainless steel sheet with a size of 4cm×4cm, and the surface multi-element high-temperature resistant diamond-like nanocomposite film material structure is 204 stainless steel substrate / Ti layer / SiC layer / Si-doped diamond-like surface layer, and the treatment process is carried out according to the following steps: (1 ) The 304 stainless steel is subjected to conventional degreasing cleaning, followed by ultrasonic cleaning in acetone and ethanol solutions; (2) The 304 stainless steel is placed in a multi-arc ion plating-magnetron sputtering composite vapor deposition vacuum system for argon plasma Sputtering cleaning, the flow rate of argon gas is 50-70sccm, the bias voltage is 800-1000V, and the processing time is 30-40 minutes; (3) Multi-arc ion plating Ti layer, the metal Ti target is the cathode, and the processing time is 5-10 minutes; ( 4) The SiC layer is deposited by magnetron sputtering, the Si target is the cathode, the working gas is argon and met...
Embodiment 2
[0021] Take a 316 stainless steel sheet with a size of 4cm×4cm, the surface multi-element high temperature resistant diamond-like nanocomposite film material structure is 316 stainless steel substrate / Ti layer / SiC layer / Si-doped diamond-like surface layer, the treatment process is carried out according to the following steps: (1 ) The 316 stainless steel was subjected to conventional degreasing cleaning, followed by ultrasonic cleaning in acetone and ethanol solutions; (2) The 316 stainless steel was placed in a multi-arc ion plating-magnetron sputtering composite vapor deposition vacuum system for argon plasma Sputtering cleaning, the argon gas flow rate is 50-70sccm, the bias voltage is 800-1000V, and the processing time is 30-40 minutes; (3) Multi-arc ion plating Ti layer, the metal Ti target is the cathode, and the processing time is 5-10 minutes; ( 4) The SiC layer is deposited by magnetron sputtering, the Si target is the cathode, the working gas is argon and methane, the...
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