Absorbing film structure based on visible band to near-infrared band
A near-infrared and absorbing film technology, applied in the field of absorbing films, can solve the problems that it is difficult to etch a large area of the metal surface, hinder the near-perfect absorption of near-infrared specific bands, and achieve low cost, high coordination and simple process. Effect
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Embodiment 1
[0014] Sputter a 200nm silver film on a silicon substrate sequentially with an argon ion beam, deposit a 50nm thick zinc oxide film on the silver film by metal-organic chemical vapor phase method, and then sputter on the zinc oxide film by magnetron sputtering 3nm gold thin film, and finally put the multilayer film structure into an environment of 300°C for half an hour to form a thin film layer with randomly distributed gold particles on the surface, with an average height of 25nm, an average size of 50nm, and a surface coverage of 22%. Finally, a multi-layer film structure with near-perfect absorption characteristics in visible to near-infrared bands is obtained.
Embodiment 2
[0016] On the quartz substrate, a 1 μm copper film was deposited sequentially by electroplating, and a 200nm-thick polyelectrolyte film was spin-coated on the silver film by the sol-gel method. In an argon ion beam sputtering instrument, a 60mA current was used to bombard the silver target for 3s on the polyelectrolyte. The silver particle layer is sputtered on the thin film, and the obtained silver particle layer has an average height of 10nm, an average particle size of 60nm, and a surface coverage of 90%. Finally, a multi-layer film structure with near-perfect absorption characteristics in visible to near-infrared bands is obtained.
Embodiment 3
[0018] On the glass substrate, 80nm gold thin film was sequentially deposited by thermal evaporation, and 1nm aluminum oxide thin film was grown on the silver thin film by atomic layer deposition method. Finally, copper particles were adsorbed on the aluminum oxide thin film by electrostatic adsorption method. The height is 100nm, the average particle size is 200nm, and the surface coverage is 3%. Finally, a multi-layer film structure with near-perfect absorption characteristics in visible to near-infrared bands is obtained.
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