Highly thermal-conductive aluminum-based copper-clad plate
A technology of aluminum-based copper clad laminate and copper clad laminate, which is applied in the direction of lamination device, lamination, and layered products, etc., can solve the problem of poor adhesion between thermally conductive adhesive layer and copper foil and aluminum plate, and reduced resistance to dip welding and voltage resistance. and other problems, to achieve the effect of reducing the existence of defects, improving the resistance to dip soldering and voltage resistance, and good fluidity
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Embodiment 1
[0031] Coat the first layer of glue and the third layer of glue on the rough surface of the copper foil and the aluminum plate. The coating thickness of the first layer of glue and the third layer of glue are both 7 μm. Imide resin, no filler, the main components of the third layer of glue are polyimide resin and alumina filler, the filler content is 20wt%, the particle size D50 is 1μm, D100 is 2μm, the second layer of glue Coated on the rough surface of copper foil coated with the first layer of glue or the aluminum plate coated with the third layer of glue, the thickness of the second layer of glue is 45 μm, and the main component of the second layer of glue is polyimide Resin and alumina filler, the filler content is 70wt%, the particle size D50 is 5μm, and the D100 is 10μm. The solvent was evaporated at 170°C, according to figure 2 As shown, it is stacked and laminated at 350°C to obtain a high thermal conductivity aluminum-based copper clad laminate.
Embodiment 2
[0033]Coat the first layer of glue and the third layer of glue on the rough surface of the copper foil and the aluminum plate. Glue, the main components of the glue are bisphenol A epoxy resin, dicyandiamide and alumina filler, the filler content is 40wt%, the particle size D50 is 2 μm, and the D100 is 6 μm. The second layer of glue is coated on the The rough surface of the copper foil of the first layer of glue or the aluminum plate coated with the third layer of glue, the coating thickness of the second layer of glue is 90 μm, and the main components of the glue of the second layer of glue are biphenyl epoxy resin, rubber modified Permanent epoxy resin, aromatic amine curing agent and spherical alumina filler, the filler content is 90wt%, the particle size D50 is 25μm, and the D100 is 60μm. The solvent was evaporated at 120°C, according to figure 2 As shown, it is stacked and laminated at 190°C to obtain a high thermal conductivity aluminum-based copper clad laminate.
Embodiment 3
[0035] Coat the first layer of glue and the third layer of glue on the rough surface of the copper foil and the aluminum plate. Glue, the main components of the glue are biphenyl epoxy resin, phenolic resin, aromatic amine curing agent and alumina filler, the filler content is 70wt%, the particle size D50 is 4μm, D100 is 10μm, the second One layer of glue is coated on the rough surface of copper foil coated with the first layer of glue or the aluminum plate coated with the third layer of glue. The thickness of the second layer of glue is 80 μm, and the main component of the second layer of glue is biphenyl Epoxy resin, bisphenol A benzoxazine resin, phenoxy resin, aromatic amine curing agent and alumina filler, the filler content is 90wt%, the particle size D50 is 10μm, and D100 is 35μm. The solvent was evaporated at 150°C, according to figure 2 As shown, it is stacked and laminated at 230°C to obtain a high thermal conductivity aluminum-based copper clad laminate.
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