Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Double-diffraction-level Offner imaging spectrometer

An imaging spectrometer and diffraction order technology, applied in the field of hyperspectral imaging, can solve the problem of increasing the difficulty of correcting off-axis aberration in the spectral dimension direction, improve energy utilization and stray light suppression capability, reduce volume and weight, and reduce weak The effect of polarization sensitivity

Inactive Publication Date: 2014-02-19
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
View PDF6 Cites 15 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the need to achieve wide-spectrum and long-line dispersion imaging on the focal plane, it increases the difficulty of correcting off-axis aberrations in the spectral dimension, which limits the improvement of spectral resolution; at the same time, the double-sided blazed grating has a longer In the interval, the diffraction efficiency is only maintained between 10% and 20%.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Double-diffraction-level Offner imaging spectrometer
  • Double-diffraction-level Offner imaging spectrometer
  • Double-diffraction-level Offner imaging spectrometer

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0013] Example 1: MWIR / LWIR double diffraction order Offner imaging spectrometer

[0014] The first-order and second-order diffraction working wavelength ranges of MWIR / LWIR dual-diffraction-order Offner imaging spectrometers are respectively selected as two octave intervals of 6-12 μm and 3-6 μm, and 6 μm is the connection and transition wavelength value of the two diffraction orders, defined For overlapping wavelengths; the dual-band area array photodetector is a cooled HgCdTe dual-band infrared focal plane array, with 320×256 pixels, 30μm pixel spacing, and response wavelength ranges of 3-6μm and 6-12μm, respectively. The dual-band area array photodetector can be a coaxial laminated sub-band response structure or a planar interlaced sub-band response structure. The coaxial laminated sub-band response structure is composed of photosensitive elements that respond to two different wavebands vertically superimposed and integrated on the detection chip. The two response waveband...

Embodiment 2

[0016] Example 2: VNIR / SWIR Dual Diffraction Order Offner Imaging Spectrometer

[0017]The first-order and second-order diffraction working wavelength ranges of the VNIR / SWIR dual-diffraction order Offner imaging spectrometer are respectively selected from two sections of 1000-2500nm and 500-1000nm, and the overlapping wavelength is 1000nm; this band imaging spectrometer is based on aviation or aerospace platforms. It has important application value in the field of remote sensing detection. The dual-band area array photodetector uses a wide-band HgCdTe monochromatic area array detector, and forms a planar interlaced sub-band response structure by interlacing with two band-pass filter films with different response bands. Broad-band HgCdTe type monochromatic area array detector responds to a wavelength range of 500-2500nm (greater than this range is also acceptable); it has 640×480 pixels and a pixel pitch of 27μm; the low pixel dimension of the detector is used for spatial dire...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a double-diffraction-level Offner imaging spectrometer and belongs to the technical field of hyperspectral imaging. The double-diffraction-level Offner imaging spectrometer comprises an Offner convex grating spectral imaging system and a dual-waveband area array photoelectric detector. The dual-waveband area array photoelectric detector is formed by coaxially stacking or parallelly manufacturing and interlacing two kinds of photosensitive elements responding wavebands. Primary diffraction light and secondary diffraction light are adopted by optical gratings in the spectral imaging system simultaneously to be used as effective work levels; the photoelectric detector receives the corresponding primary diffraction light and secondary diffraction light respectively at the same time. According to the double-diffraction-level Offner imaging spectrometer, the dual-waveband area array photoelectric detector is used for being matched with optical grating double-diffraction-level spectrum bands, simultaneous detection of the primary diffraction wavebands and secondary diffraction wavebands is achieved, the working spectral region of the spectrometer is enlarged, and diffraction efficiency is improved; it is facilitated that the overall polarization sensitivity of the spectrometer is reduced; according to the dual-waveband area array photoelectric detector, the light path structure is simplified, the spectrometer size and weight are reduced, and alignment of space dimension pixels of two wavebands and alignment of primary and secondary diffraction frequency doubling wavelengths are automatically achieved.

Description

technical field [0001] The invention belongs to the technical field of hyperspectral imaging, and relates to an Offner imaging spectrometer using dual-band detectors and double-diffraction order co-channel detection. Background technique [0002] The Offner convex grating spectral imaging system is developed on the basis of the reflective Offner relay optical system. It replaces the convex mirror in the Offner relay optical system with a convex diffraction grating to achieve dispersion and separation of divergent polychromatic beams. The Offner convex grating spectral imaging system has the advantages of simple structure, small size, light weight, uniform dispersion, weak spectral line bending and small color distortion. Traditional grating-type wide-band imaging spectrometers generally use a color splitter to first divide the polychromatic light into two different bands, and then use two independent dispersive optical path systems to process them separately; or use a common...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G01J3/28G01J3/02
Inventor 方伟张浩叶新
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products