Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Manufacture method for low polarization sensitivity dichroic film of medium metallic film pile

A production method and metal film technology, applied in optical components, optics, instruments, etc., can solve the problems of difficulty in ensuring low polarization sensitivity, large errors, and many film stacks, so as to ensure design functions, prevent production errors from accumulating and magnifying, Easy to monitor the effect of production

Inactive Publication Date: 2016-06-01
SHANGHAI INST OF TECHNICAL PHYSICS - CHINESE ACAD OF SCI
View PDF4 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there are many membrane stacks designed by this method, and each membrane stack needs to be strictly matched with a specific optical admittance method. T

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Manufacture method for low polarization sensitivity dichroic film of medium metallic film pile
  • Manufacture method for low polarization sensitivity dichroic film of medium metallic film pile
  • Manufacture method for low polarization sensitivity dichroic film of medium metallic film pile

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0022] The specific embodiments of the present invention will be described below based on examples and drawings.

[0023] Take the production of a low polarization sensitivity dichroic film system working in an air environment at 45° incidence as an example. The film system requires reflection of all wavelengths greater than 2000nm, transmission of visible light of 400-700nm, and requires the transmission of light to maintain polarization in the band The sensitivity is less than 1%. The substrate is made of fused silica. The traditional ZnS-Ag-ZnS film structure cannot meet the requirements of low polarization sensitivity. If the coating material is selected as Ta 2 O 5 , Ag and SiO 2 The manufacturing method proposed by the present invention can meet the control requirements of low polarization sensitivity, and the specific implementation is as follows:

[0024] 1) According to the admittance matching method, the designed preliminary film structure is quartz / (38.9nmTa 2 O 5 / 9.4nm...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a manufacture method for a low polarization sensitivity dichroic film of a medium metallic film pile, comprising steps of determining an initial optical film design through an optical admittance technology on the basis of a film pile combination of a medium-metal-medium structure, performing film system fine adjustment and optimization through an optical film design software, which enables the film system structure to be easy to monitor and manufacture, performing cleaning an pre-plating processing on the substrate, adopting evaporation or sputtering method to perform film deposition, adopting a reflection type optical monitoring system to perform half-direct monitoring, wherein each film pile adopts a monitoring sheet, and finishing the deposition of all film piles and outputting the finished good. The invention can manufacture a high precision and low polarization sensitivity dichroic film, the color separation spectrum performance is excellent, and the low polarization sensitivity of the light transmission band can be maintained.

Description

technical field [0001] The invention relates to optical thin film technology, in particular to a method for manufacturing a low-polarization-sensitivity dichroic film of a dielectric metal film stack. Background technique [0002] Dichroic filters are widely used in optical systems, especially optical systems for multi-band detection. In order to achieve color separation in a wide spectral range, such as the separation of visible light, near-infrared light, and mid- and long-wave infrared light, the dichroic film system of the color separation film often adopts a dielectric-metal-dielectric structure. A typical example is zinc sulfide-silver- Zinc sulfide structure. Since the dichroic filter usually works in the case of oblique incidence, it will bring about the separation of the polarization spectrum of the light. For some remote sensing optical systems, there is a change in the polarization state of the incident light, which will cause a change in the photoelectric signa...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G02B1/10
CPCG02B1/10
Inventor 蔡清元刘定权郑玉祥周靖罗海瀚丛蕊秦杨王曙光刘保剑
Owner SHANGHAI INST OF TECHNICAL PHYSICS - CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com