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Noble metal ceramic film and preparation method thereof

A ceramic thin film and precious metal technology, applied in the field of design and preparation of new metal ceramic thin film materials, can solve the problems of surface plasmon resonance absorption effect, change the electronic structure of Ag metal, low melting point of alloy, etc., and achieve excellent anti-oxidation performance and cost. Inexpensive, inexpensive effects

Active Publication Date: 2014-02-12
NINGBO INST OF MATERIALS TECH & ENG CHINESE ACADEMY OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] However, for metal Ag, due to its own low melting point (about 962°C), the melting point of the alloy is still low. The most worrying thing is that the doping of heterogeneous metals will change the electronic structure of Ag metal itself, making its The surface plasmon resonance absorption effect is affected, which is especially necessary for some occasions that require a strong resonance effect in the resonance wavelength range and a narrow resonance peak width
At present, no work has been done to improve its thermal stability without affecting its physical optical properties as much as possible.

Method used

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  • Noble metal ceramic film and preparation method thereof
  • Noble metal ceramic film and preparation method thereof
  • Noble metal ceramic film and preparation method thereof

Examples

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Effect test

Embodiment 1

[0045] Place the quartz wafer and (100) single crystal silicon wafer to be plated in the deposition chamber, pre-evacuate, and the background vacuum is 4×10 -4 Pa, heat the quartz sheet and (100) single crystal silicon sheet to make the temperature 150°C, and at the same time pass Ar gas to raise the pressure of the vacuum chamber to 0.45Pa, keep it warm for 30min for desorption, and remove the impurities physically adsorbed on the surface of the substrate , which is conducive to improving the bonding force between the film and the substrate; then close the introduction of Ar gas, and re-pump the deposition chamber to 2×10 -4 Pa, and Ar gas was introduced again to increase the pressure of the deposition chamber to 0.45Pa; turn on the RF bias of the substrate, set its power to 100W and glow, sputter for 10min, and further clean the surface of the substrate; turn off the cleaning bias and Turn on Al 2 o 3 For the RF drive power supply of the target, adjust its power to 120W, p...

Embodiment 2

[0051] Place the quartz plate to be plated in the deposition chamber, pre-evacuate, and the background vacuum is 3.6×10 -4 Pa, heat the quartz substrate to a temperature of 150°C, and at the same time pass in Ar gas to increase the pressure of the deposition chamber to 0.45 Pa, keep it warm for 30 minutes for desorption, and remove physically adsorbed impurities on the surface of the substrate, which is beneficial to enhance the film and substrate The binding force between the sheets; then close the flow of Ar gas, and re-pump the deposition chamber to 1.8×10 -4 Pa, and Ar gas was introduced again to increase the pressure of the deposition chamber to 0.45Pa; turn on the RF bias of the substrate, set its power to 100W and glow, sputter for 10min, and further clean the surface of the substrate; turn off the cleaning bias and Turn on Al 2 o 3 For the RF drive power supply of the target, adjust its power to 120W, pre-sputter for 60 minutes, turn on the drive power of the Ag targ...

Embodiment 3

[0053] Place the quartz substrate to be plated in the deposition chamber, pre-evacuate, and the background vacuum is 3.4×10 -4 Pa, heat the quartz substrate to a temperature of 150°C, and at the same time pass in Ar gas to increase the pressure of the vacuum chamber to 0.45Pa, keep it warm for 30min for desorption, and remove physically adsorbed impurities on the surface of the substrate, which is beneficial to enhance the film and substrate The binding force between the sheets; then close the introduction of Ar gas, and re-pump the vacuum chamber to 1.6×10 -4 Pa, and re-introduce Ar gas to raise the pressure of the vacuum chamber to 0.45Pa again; turn on the substrate RF bias, set its power to 100W and glow, sputter for 10min, and further clean the substrate surface; turn off the cleaning bias and Turn on Al 2 o 3 For the RF drive power supply of the target, adjust its power to 120W, pre-sputter for 60 minutes, turn on the drive power of the Ag target and Ti target at the s...

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Abstract

The invention discloses a noble metal ceramic film, wherein the noble metal ceramic film comprises a noble metal alloy / ceramic composite layer, and a ceramic passivation layer, wherein the noble metal alloy particles in the composite layer are embedded into a ceramic phase; the ceramic passivation layer is covered at the surface of the composite layer; matrix metal of the noble metal alloy is Ag; the doped metal is Al or Ti; the ceramic phase is Al2O3 or SiO2; the ceramic passivation layer is Al2O3 or SiO2 passivation layer. The invention also discloses a preparation method of the noble metal ceramic film. The method is carried out by adopting a multi-target magnetron co-sputtering technology; the preparation technology is simple; components and a micro-structure of the film are easily regulated and controlled; the obtained noble metal ceramic film has strong surface plasma resonance absorption characteristics in ultraviolet and visible light areas, and has excellent high temperature resistance.

Description

technical field [0001] The invention relates to the field of design and preparation of novel cermet thin film materials, in particular to a noble metal ceramic thin film and a preparation method thereof. Background technique [0002] Noble metal nanoparticles have attracted extensive attention due to their interesting properties, such as exhibiting various special colors, biological antibacterial properties, catalysis, and generation of surface plasmon resonance absorption. In its practical application, noble metal nanoparticles are usually embedded in other matrices to form composite materials, such as embedded in SiO 2 or Si 3 N 4 It can be compounded into a cermet material in the ceramic phase, so that while maintaining its unique metal properties, it can protect the precious metal particles from oxidation or corrosion, and can be used in various complex working conditions. [0003] As early as the 4th and 5th centuries BC, various types of dyes appeared in ancient Egy...

Claims

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Application Information

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IPC IPC(8): C23C14/35C23C14/08C23C14/16
Inventor 高俊华曹鸿涛俞科涂承君梁凌燕刘志敏
Owner NINGBO INST OF MATERIALS TECH & ENG CHINESE ACADEMY OF SCI
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