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Upper surface antireflective film forming composition and pattern forming method using same

A technology of antireflection film and composition, which is applied in the field of upper antireflection film forming composition and composition of antireflection film, can solve problems such as practical difficulties, and achieve the effect of sufficient film formation

Active Publication Date: 2013-12-18
MERCK PATENT GMBH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, according to studies by the inventors of the present invention, not all of the compositions for forming an upper surface antireflection film described in these patent documents have sufficient effects, and when they are produced, they can meet the requirements of film forming properties, refractive index, stability over time, etc. The composition of all properties leaves room for further improvement
In addition, the low-molecular-weight fluorine compound described in Patent Document 1 is an important substance for realizing a low yield ratio as a component of the upper surface antireflection film, but it is becoming difficult to supply it for practical use due to recent safety standards.

Method used

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  • Upper surface antireflective film forming composition and pattern forming method using same
  • Upper surface antireflective film forming composition and pattern forming method using same
  • Upper surface antireflective film forming composition and pattern forming method using same

Examples

Experimental program
Comparison scheme
Effect test

example 1～25

[0094] Fluoropolymers having different weight-average molecular weights represented by the general formula (1) are prepared, and the polymer, alkylsulfonic acid, or a surfactant used as a comparison object is dissolved in water as a solvent to prepare the upper surface resistance. Composition for forming a reflective film. Alternatively, in alkyl sulfonic acids or surfactants, use:

[0095] S-1: Alkane sulfonic acid mixture with 10 to 18 carbon atoms

[0096] S-2: Ethylene oxide adduct of acetylene diol (Surfynol 485 (trade name), manufactured by Air Products Limited.), nonionic surfactant

[0097] S-3: Polyoxyethylene lauryl amino ether (D-3110-P (trade name), manufactured by Takemoto Oil Co., Ltd.), nonionic surfactant

[0098] S-4: Alkyl diphenyl ether sulfonic acid mixture with an average carbon number of 12

[0099] S-5: Ethanesulfonic acid

[0100] S-6: Octanesulfonic acid

[0101] S-7: Camphorsulfonic acid

[0102] S-8: p-toluenesulfonic acid

[0103] S-9: dodecy...

example 26～31

[0120] A composition for forming an upper surface antireflective film containing a fluoropolymer represented by general formula (1) and having a weight average molecular weight of 340,000, alkylsulfonic acid S-1 or S-4, and various amine compounds was prepared. Here, the contents of the polymer, the alkylsulfonic acid, and the amine compound were set to 2.0% by weight, 0.1% by weight, and 0.2% by weight, respectively, based on the total weight of the composition. Using these compositions, the same evaluation as Examples 1-25 was performed. The results obtained are shown in Table 2. In addition, examples 13 and 20 in Table 1 are also shown together for reference.

[0121] Table 2

[0122]

[0123] From these results, it can be seen that the composition for forming an antireflective film on the upper surface of the present invention tends to improve film-forming properties and in-plane uniformity as compared with compositions containing conventional surfactants regardless o...

example 32～37

[0125] A composition for forming an upper surface antireflection film containing a fluoropolymer represented by the general formula (1) and having a weight average molecular weight of 340,000, an additional polymer, and alkylsulfonic acid S-1 was prepared. Here, as the additional polymer, polyacrylic acid P-1 (weight average molecular weight: 5,000) or polyvinylpyrrolidone P-2 (polymerization average molecular weight: 5,000) was used. The total polymer content and the alkylsulfonic acid content were set to 2.0% by weight and 0.1% by weight, respectively, based on the total weight of the composition. In addition, the compounding ratio of a fluorine-containing polymer and an additional polymer is shown in Table 3. Using these compositions, the same evaluation as Examples 1-25 was performed. However, a resist composition for i-line (MiR703 (trade name), manufactured by AZ Electronic Materials Inc.) was used for evaluation of film thickness reduction. The obtained results are sh...

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Abstract

[Problem] To provide an upper surface antireflective film forming composition, having film formability, a refractive index, temporal stability, and safety all equal to or better than conventional products, and a pattern forming method using the same. [Solution] The upper surface antireflective film forming composition is characterized by comprising: a fluorine containing polymer having a weight-average molecular weight of 300,000-800,000, said polymer being represented by general formula (1): -Ax-By- (1) (where A is a repeating unit represented by general formula (A): (where R is a fluorine containing alkylene group with a carbon number of 1-40, or a fluorine containing alkylene group which has an ether linkage and has a carbon number of 2-100); B is a repeating unit with which it is possible to form a copolymer by bonding with A; x and y are numbers representing polymerization ratios; x is not 0; and A and B may randomly be bonded, or form blocks); an alkyl sulfonic acid with a carbon number of 10-18; and a solvent.

Description

technical field [0001] The present invention relates to a composition for forming an upper surface antireflection film. More specifically, in the case of manufacturing flat panel displays (FPDs) such as liquid crystal display elements, semiconductor devices, charge-coupled devices (CCDs), color filters, etc., by photolithography, it is used to form The composition of the antireflection film on the upper side of the resist film. In addition, the present invention also relates to a pattern forming method using such an upper antireflection film-forming composition. Background technique [0002] Photolithography is used to manufacture FPDs such as liquid crystal display elements, semiconductor devices, CCDs, and color filters. In the process of using photolithography to manufacture integrated circuit components, such as coating a positive or negative resist on a substrate, removing the solvent by baking, and then using ultraviolet rays, extreme ultraviolet rays, electron rays,...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/11H01L21/027
CPCG03F7/0046G03F7/091G03F7/11H01L21/027G03F7/26G03F7/20
Inventor 片山朋英佐尾高步
Owner MERCK PATENT GMBH
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