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Method for cleaning electrosparking grid mesh

An electric spark and grid technology is applied in the field of electric spark machining grid cleaning, which can solve the problems of EDM oxidation, carbide residues, and EDM marks on finished grids, so as to reduce time and process, simple craftsmanship

Inactive Publication Date: 2013-12-04
HUADONG PHOTOELECTRIC TECHN INST OF ANHUI PROVINCE
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the electron gun of vacuum electronic devices, molybdenum grids are needed. At present, there are two processing methods for molybdenum grids: photolithography and electric spark etching. Photolithography is a relatively mature processing method. EDM grids As a relatively recent method of making grids, there are still many technical difficulties. There are problems such as spark etching marks, spark etching oxidation, and carbide residues in etching on the finished grid.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0016] This embodiment includes the following steps:

[0017] (1) Put the grid into the degreasing solution at 50°C and ultrasonically degrease fully for at least 20 minutes. After degreasing, rinse with running tap water for at least 20 seconds. The degreasing solution includes a volume ratio of 5:5: 2: Sodium oxalate, sodium tartrate, OP emulsifier and deionized water at 1800, add sodium oxalate and sodium tartrate in deionized water in turn to turn on the ultrasonic wave, and add the formula amount of OP emulsifier;

[0018] (2) Treat the grid in a sodium hydroxide solution at 90°C for 2 hours. The sodium hydroxide solution includes sodium hydroxide and deionized water with a volume ratio of 1:6 to prepare a sodium hydroxide solution: according to the formula Weigh the proportioned amount of sodium hydroxide and deionized water, add the proportioned amount of sodium hydroxide to the container, then add the proportioned amount of deionized water, and carefully stir with a gl...

Embodiment 2

[0024] (1) Put the grid into the degreasing solution and ultrasonically degrease fully at 60°C for at least 20 minutes. After degreasing, rinse it with running tap water for at least 20 seconds. The degreasing solution includes a volume ratio of 7:7: 4: 2200 sodium oxalate, sodium tartrate, OP emulsifier and deionized water;

[0025] (2) Treat the grid in a sodium hydroxide solution at 100°C for 4 hours, and the sodium hydroxide solution includes sodium hydroxide and deionized water with a volume ratio of 3:8;

[0026] (3) Treat the grid under a microscope at 16 times, and wipe the surface of the grid with a soft brush dipped in absolute ethanol until the large stains are removed, and repeat steps (2) and (3) until the stains are removed;

[0027] (4) Put the grid into the first pickling solution at 25°C for 6 seconds, and wash it in running tap water for at least 20 seconds. The first pickling solution includes trioxide with a volume ratio of 7:2:26. Chromium, sulfuric acid ...

Embodiment 3

[0032] (1) Put the grid into the degreasing solution at 55°C and ultrasonically degrease fully for at least 20 minutes. After degreasing, rinse with running tap water for at least 20 seconds. The degreasing solution includes a volume ratio of 6:6: 3: 2000 sodium oxalate, sodium tartrate, OP emulsifier and deionized water;

[0033] (2) Treat the grid in a sodium hydroxide solution at 95°C for 3 hours, and the sodium hydroxide solution includes sodium hydroxide and deionized water with a volume ratio of 2:7;

[0034] (3) Treat the grid under a microscope at 16 times, and wipe the surface of the grid with a soft brush dipped in absolute ethanol until the large stains are removed, and repeat steps (2) and (3) until the stains are removed;

[0035] (4) Put the grid into the first pickling solution at 22°C for 5 seconds, and wash it in running tap water for at least 20 seconds. The first pickling solution includes trioxide with a volume ratio of 6:1:25. Chromium, sulfuric acid and ...

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PUM

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Abstract

The invention discloses a method for cleaning an electrosparking grid mesh. The method includes the steps that the grid mesh is placed into a degreasing solution for degreasing, the grid mesh is treated in a sodium hydroxide solution, the grid mesh is treated under a microscope, a banister brush dipped in absolute ethyl alcohol is used for grooming the surface of the grid mesh until large blots are removed, the grid mesh is placed into a first pickling solution to be treated, the grid mesh is placed into a second pickling solution to be treated, and cleaning, dehydration and drying are conducted in flowing hot water. The method for cleaning the electrosparking grid mesh is simple in technology, the main treatment method of the grid mesh is a physical treatment method, the chemical treatment time and process are reduced, and the original processing size value of the size of the treated grid mesh can be reserved maximally.

Description

technical field [0001] The invention relates to a metal surface treatment technology, in particular to a method for cleaning electric discharge machining grids. Background technique [0002] Due to the outstanding advantages of small size, light weight and high reliability, vacuum electronic devices play an increasingly important role in low-power modern weaponry. In the electron gun of vacuum electronic devices, molybdenum grids are needed. At present, there are two processing methods for molybdenum grids: photolithography and electric spark etching. Photolithography is a relatively mature processing method. EDM grids As a relatively recent method of making grids, there are still many technical difficulties. There are problems such as spark etching marks, spark etching oxidation, and carbide residues in etching on the finished grid. Contents of the invention [0003] The purpose of the present invention is to overcome the deficiencies of the prior art, and provide a clea...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B7/04
Inventor 吴华夏卢希跃曹振玲程奎苏靖马宁宁高秀丽
Owner HUADONG PHOTOELECTRIC TECHN INST OF ANHUI PROVINCE
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