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Exposure apparatus and exposure method

An exposure device and technology to be exposed, applied in the field of substrate manufacturing, can solve the problems of surface morphology developer damage, reduced product performance indicators, loose pattern structure, etc. The effect of structural stabilization

Inactive Publication Date: 2013-11-27
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The graphics produced in this way have reduced CD deviation, but the graphics structure is bound to be loose, and the surface morphology is easily damaged by the developer, resulting in defects and reducing the performance indicators of the product.

Method used

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  • Exposure apparatus and exposure method
  • Exposure apparatus and exposure method
  • Exposure apparatus and exposure method

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Embodiment Construction

[0030] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention.

[0031] An embodiment of the present invention provides an exposure device, such as figure 1 As shown, the exposure device includes: an exposure light source 1, a compound eye system 2, an optical system 3, and two diaphragms 4, and the two diaphragms 4 are arranged on the incident surface side or the exit surface of the compound eye system 2 One side, and the two diaphragms 4 are arranged symmetrically with respect to the center of the compound eye system 2; wherein, the orientation of the opening formed by the two diaphragms 4 (hereinafter referred to as the opening orientation) depends on the key of the component to be exposed Size orientation adjustment.

[0032] H...

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Abstract

Embodiments of the present invention provide an exposure apparatus and an exposure method, and relates to the field of substrate manufacture, wherein performance indexes of the product can not be affected in the case of effective reduction of CD deviation. The exposure apparatus comprises: an exposure light source, a compound eye system, an optical system, and two diaphragms, wherein the two diaphragms are arranged on one side of the incidence surface or the exiting surface of the compound eye system, and are symmetrically arranged relative to the center of the compound eye system, and the opening orientation of the two diaphragms are adjusted according to the critical dimension CD orientation of a member requiring exposure.

Description

technical field [0001] The invention relates to the field of substrate manufacturing, in particular to an exposure device and an exposure method. Background technique [0002] In the existing substrate manufacturing process, the completion of a pattern on the substrate requires processes such as photoresist coating, exposure, development, and etching. During exposure, the ultraviolet light incident on the mask is passed through the optical system of the exposure device. After processing the non-ideal collimated light, the divergence angle of the paraxial ray is the smallest, and when it is projected near the exposure plane, it is the closest to the ideal parallel light, while the divergence angle of the marginal ray is the largest. The divergence angle of the edge light will expand the exposure range of the photoresist, so that there is a certain deviation between the finally formed photoresist pattern size and the pattern size on the mask plate. [0003] In order to ensure...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/701
Inventor 彭川
Owner BOE TECH GRP CO LTD
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