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Manufacturing method and application for phosphorous composition coated nanometer silicon slurry

A technology of nano-silicon and composition, applied in the fields of nanotechnology, nanotechnology, nanotechnology for materials and surface science, etc., can solve the problem of difficult to achieve the best effect, affect the photoelectric conversion efficiency of the light-receiving area, and affect the current of the silver grid line. Export efficiency and other issues, to achieve the effect of high adhesion, high line definition, and prevention of nano-silicon oxidation

Active Publication Date: 2013-09-11
宁波革鑫新能源科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

A high phosphorus doping concentration will affect the photoelectric conversion efficiency of the light-receiving area, and a low phosphorus doping concentration will affect the current export efficiency of the silver grid line. The existing doping process is often difficult to achieve the best effect

Method used

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  • Manufacturing method and application for phosphorous composition coated nanometer silicon slurry
  • Manufacturing method and application for phosphorous composition coated nanometer silicon slurry
  • Manufacturing method and application for phosphorous composition coated nanometer silicon slurry

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0032] Preparation: use a high-energy ball mill to grind the silicon material for 1 hour to obtain small silicon particles of 10-100 microns; vacuumize the system and fill it with argon. After several cycles, the system is argon atmosphere. Adjust the working gas pressure of the system between 0.1-0.5MPa. Turn on the power supply of the plasma generator, the power is 100 kilowatts, the frequency is 10 MHz, and the voltage and current are adjusted in the range of 100-200V and 50-200A respectively to stabilize the plasma torch; start the powder feeder and use the argon flow to The speed of 200 grams of silicon powder per hour brings micron-sized silicon particles into the plasma torch, and forms nano-silicon with a particle size of 10-100 nm through gasification, nucleation, and growth steps. When the temperature drops to 60-120 o At C, spray the solution at a rate of 900 grams per hour to collect the powder. The powder collection solution is mixed with 1:1 hexamethyldisiloxan...

Embodiment 2

[0035] Preparation: Use a high-energy ball mill to grind silicon particles for 1-4 hours to obtain small silicon particles with a size of 10-100 microns; prepare nano-scale silicon powder: vacuumize the system and fill it with argon. After several cycles, the system is argon atmosphere. Adjust the working gas pressure of the system between 0.1-0.5MPa. Turn on the power supply of the plasma generator, the power is 100 kilowatts, the frequency is 10 MHz, and the voltage and current are adjusted in the range of 100-200V and 50-200A respectively to stabilize the plasma torch; start the powder feeder and use the argon flow to The speed of 100 grams of silicon powder per hour brings micron-sized silicon particles into the plasma torch, and forms nano-silicon with a particle size of 10-100nm through gasification, nucleation, and growth steps. When the temperature drops to 60-120 oAt C, spray the solution at a speed of 900 grams per hour to collect the powder. The powder collection ...

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Abstract

The invention discloses a manufacturing method and application for phosphorous composition coated nanometer silicon slurry. The manufacturing method includes steps of 1), manufacturing nanometer silicon suspension liquid; 2), preparing phosphorous polymers in the nanometer silicon suspension liquid manufactured in the step (1) and blowing protective atmosphere into the nanometer silicon suspension liquid in a reaction procedure; 3), stirring the nanometer silicon suspension solution while preparing the phosphorous polymers in the nanometer silicon suspension solution in the step (2), uniformly mixing and dispersing the nanometer silicon suspension liquid and the phosphorous polymers to obtain the phosphorous nanometer silicon slurry. The viscosity of the phosphorous nanometer silicon slurry ranges from 0.5PaS to 9.0PaS. The manufacturing method and the application have the advantages that after the manufactured phosphorous nanometer silicon slurry is printed on the surface of a silicon wafer of a cell via a screen, lines of the silicon wafer are high in clearness, the silicon wafer is free of burrs, low-concentration phosphor doping can be performed on a light receiving region of the cell while high-concentration phosphor doping can be performed on a silver grid line contact region of the cell, and accordingly an optimal effect can be realized.

Description

technical field [0001] The invention belongs to the technical field of nanomaterials, and in particular relates to a preparation method and application of a phosphorus composition-coated nano-silicon slurry. Background technique [0002] At present, the development of traditional crystalline silicon cells at home and abroad is relatively mature, and the basic process steps of the cells are: texturing→diffusion→silicon nitride passivation→conductive silver paste printing→sintering→cells. After the silver paste is sintered, a grid line is formed on the surface of the cell to export the current generated by photoelectric conversion. If the contact resistance between the silver grid line and the silicon material interface is too large, it will directly affect the power generation efficiency of the cell. The study found that in the traditional cell diffusion process, phosphorus oxychloride gas is used to diffuse the silicon surface at high temperature, and the doping concentratio...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/22H01L31/18B82Y30/00
CPCY02P70/50
Inventor 杨小旭刘国钧蒋红彬沈晓东钟朝伟
Owner 宁波革鑫新能源科技有限公司
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