Zn (zinc)-Sb (stibium)-Te (tellurium) phase change storage thin-film material for phase change memory and preparation method of Zn-Sb-Te phase change storage thin-film material
A phase change memory, zn-sb-te technology, applied in the direction of electrical components, etc., can solve the problems that affect the data access speed and reliability of PRAM, the poor stability of N-Sb-Te, and the phase change mutation point is not obvious. , to achieve the effect of improving the crystallization temperature and data retention ability, fast crystallization speed, and easy industrial mass production
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Embodiment 1
[0028] A Zn-Sb-Te phase-change memory film material for phase-change memory according to the present invention is composed of three elements Zn, Sb and Te, and the three elements of zinc, antimony and tellurium in the phase-change material are two by two bonds to form a ternary system.
Embodiment 2
[0030] A kind of Zn-Sb-Te phase-change memory film material used for phase-change memory of the present invention, its general chemical structure formula is Zn X (Sb 2 Te 3 ) 100-X , where 0<x<40, the specific preparation method is as follows:
[0031] In the magnetron sputtering coating system (JGP-450 type), the zinc single target is installed in the magnetron direct current (DC) sputtering target, and the Sb 2 Te 3 The target is installed in the magnetron radio frequency (RF) sputtering target, and the quartz sheet or silicon oxide sheet is used as the substrate. The sputtering chamber of the magnetron sputtering coating system is vacuumed until the vacuum degree of the chamber reaches 1.6×10 -4 Pa, and then pass high-purity argon gas with a volume flow rate of 47.6ml / min (SCCM standard condition milliliter per minute) into the sputtering chamber until the pressure in the sputtering chamber reaches the ignition pressure of 0.3Pa required for sputtering, and then control...
Embodiment 3
[0033] With above-mentioned embodiment 2, its difference is: in the preparation process alloy Sb 2 Te 3 The sputtering power of the target is controlled to 80W, and the sputtering power of the Zn single target is controlled to 0W, and the Sb 2 Te 3 Phase change memory thin film material.
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