Method of processing and preparing black Y203 ceramic coating with hydrogen plasma

A technology of plasma hydrogen and Y2O3, which is applied in the coating, metal material coating process, fusion spraying, etc., can solve the problems of high cost, large damage to the etching process cavity wall, and limited life of parts, and achieve low cost Effect

Active Publication Date: 2013-06-05
锐立平芯微电子(广州)有限责任公司
View PDF2 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Entering the 300mm equipment, as the plasma power increases, the plasma damages the etching process cavity wall more and more, making the following problems prone to occur during the etching process: (1) particles; (2) process The cavity wall coating peels off, causing the plasma to directly interact with the aluminum substrate; (3) Al 2 o 3 Component life limited by higher power
[0008] Black Y can be well prepared by laser radiation or electron beam radiation. 2 o 3 Coating, Y after laser beam irradiation or electron beam irradiation 2 o 3 The coating powder is melted and recombined, the binding force between the bonds is enhanced, the chemical activity is significantly improved, and the Vickers hardness is increased, so that the wear resistance is better, but the cost is higher

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method of processing and preparing black Y203 ceramic coating with hydrogen plasma

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0028] The technical solution of the present invention will be described in detail below in conjunction with the accompanying drawings and embodiments.

[0029] Such as figure 1 As shown, the embodiment of the present invention provides a kind of plasma hydrogen treatment and prepares black Y 2 o 3The method for ceramic coating specifically comprises the steps:

[0030] (1) Choose Y 2 o 3 Powder, the particle size range is 5-50μm, the powder should have a single cubic phase structure; the original particle size of the powder is 40-60nm, the particle size after secondary granulation is 5-50μm, and the large-grained powder after granulation is porous The spherical shape of the structure is a hollow micron sphere assembled by small nano-particles, which has excellent fluidity;

[0031] (2) Sandblasting the inner wall of the etching process chamber of the aluminum substrate to be sprayed, the sandblasting material is white corundum, the particle size range is 50-100 μm, and c...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to the technical field of manufacture of Y203 ceramic coatings, in particular to a method of processing and preparing a Y203 ceramic coating. The method comprises the following steps: choosing Y203 powder with purity higher than 99.95%, carrying out pre-processing on base materials to be sprayed, carrying out plasma spraying on the base materials through plasma spraying equipment to prepare the Y202 coating, and carrying out hydrogen plasma processing on the prepared Y203 coating in the last step to obtain a black Y203 coating. The black Y203 coating prepared through a hydrogen plasma reduction method is etching resisting and dirty resisting, and low in cost.

Description

technical field [0001] The present invention relates to Y 2 o 3 The technical field of ceramic coating manufacturing, specifically relates to a kind of plasma hydrogen treatment to prepare black Y 2 o 3 Methods of ceramic coating. Background technique [0002] At present, the low-temperature plasma microfabrication method is the key technology for micro-nano processing of materials. It is the basis of preparation technologies such as microelectronics, optoelectronics, micromechanics, and micro-optics. One of the processes is completed by means of plasma processing, such as plasma film deposition, plasma etching, and plasma deglue. Among them, plasma etching is one of the most critical processes, and it is an irreplaceable process to realize the high-fidelity transfer of micro-patterns in VLSI production from photolithographic templates to silicon wafers. [0003] During the etching process, due to the presence of a large number of highly corrosive active free radicals (...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C23C4/12C23C4/10C23C4/11C23C4/134
Inventor 邵花王文东刘邦武夏洋李勇滔
Owner 锐立平芯微电子(广州)有限责任公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products