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Manufacturing method of array substrate for liquid crystal display

A technology for liquid crystal display devices and array substrates, applied in semiconductor/solid-state device manufacturing, optics, instruments, etc., can solve problems such as difficulty in use, copper metal layer damage, etc., achieve simplified etching process, excellent etching uniformity, and prevent electrical short circuit or the effect of poor wiring

Active Publication Date: 2013-03-20
DONGWOO FINE CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But, under the situation of above-mentioned patent, because the damage of hydrochloric acid to copper metal layer is serious, there is the shortcoming that is difficult to use

Method used

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  • Manufacturing method of array substrate for liquid crystal display
  • Manufacturing method of array substrate for liquid crystal display
  • Manufacturing method of array substrate for liquid crystal display

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1 to Embodiment 28、 comparative example 1 to comparative example 15

[0100] Example 1 to Example 28, Comparative Example 1 to Comparative Example 15: Preparation of etchant composition

[0101] According to the compositions shown in Table 1 below, 180 kg of etchant compositions of Examples 1 to 28 and Comparative Examples 1 to 15 were prepared.

[0102] [Table 1]

[0103]

[0104] ATZ: Aminotetrazole

[0105] [Table 2]

[0106]

[0107]

[0108] ATZ: Aminotetrazole

[0109] PTSA: p-toluenesulfonic acid

[0110] SFA: sulfanilic acid

[0111] [table 3]

[0112]

[0113] ATZ: Aminotetrazole

[0114] [Table 4]

[0115]

[0116] ATZ: Aminotetrazole

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Abstract

The invention relates to a manufacturing method of an array substrate for a liquid crystal display, and the method comprises steps of: a) forming a grid on the substrate; b) forming a gate insulation layer on the substrate comprising the grid; c) forming a semiconductor layer on the gate insulation layer; d) forming a source electrode / drain electrode on the semiconductor layer; and e) forming a pixel electrode connected with the drain electrode; the step a) comprises steps of: forming a copper based metal film on the substrate, a multi-layer of a copper based metal layer and a metal oxide film, or a multi-layer of a copper based metal layer and a molybdo-based metal layer; and etching the film to form the grid through etching agent composition; the step d) comprises steps of: forming a copper based metal layer on the semiconductor, a multi-layer of a copper based metal layer and a metal oxide film, or a multi-layer of a copper based metal layer and a molybdo-based metal layer; and etching the film to from the source electrode / drain electrode through the etching agent composition.

Description

technical field [0001] The invention relates to a method for manufacturing an array substrate for a liquid crystal display device. Background technique [0002] The process of forming metal wiring on a substrate of a liquid crystal display device generally includes a process of forming a metal film using sputtering or the like, performing a process of applying a photoresist, forming a photoresist on a selective region based on exposure and development, and A process of etching is performed, and a cleaning process and the like are performed before and after each individual process. The etching process refers to a process of forming a metal film on a selective region using a photoresist as a mask, and generally includes dry etching using plasma or the like, or wet etching using an etchant composition. [0003] In this liquid crystal display device, resistance of metal wiring has recently become a major focus of attention. This is because, in the thin film transistor-liquid c...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/77H01L21/48G02F1/1362G02F1/1368
Inventor 李铉奎李石李恩远郑敬燮金镇成田玹守
Owner DONGWOO FINE CHEM CO LTD
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