Phosphorous diffusion method for polycrystalline silicon solar battery
A solar cell and phosphorus diffusion technology, applied in diffusion/doping, chemical instruments and methods, circuits, etc., can solve problems affecting the photoelectric conversion efficiency of crystalline silicon solar cells, improve oxidation quality, reduce pollution, and increase minority carrier life Effect
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[0024] A phosphorus diffusion method for a polycrystalline silicon solar cell, comprising the steps of:
[0025] (1) Place the silicon wafer to be treated in a diffusion furnace, so that the temperature of each temperature zone in the furnace rises to 800 ° C, and the atmosphere in the furnace is a nitrogen environment of 10 L / min;
[0026] (2) After the temperature in the furnace is stabilized, the temperature of each temperature zone in the furnace is raised to 850 °C, and at the same time, 1 L / min of HCl-carrying gas is evenly introduced for 20 min;
[0027] (3) Stop feeding HCl-carrying gas, and only feed 1.5 L / min dry oxygen for 10 min;
[0028] (4) Evenly introduce 1 L / min of phosphorus-carrying source gas and 1.5 L / min of dry oxygen, and the diffusion time is 20 minutes;
[0029] (5) Stop feeding the phosphorus-carrying source gas, and only feed 1 L / min of HCl-carrying gas for 10 minutes;
[0030] (6) Stop feeding HCl-carrying gas, and only feed 1.5 L / min dry oxygen f...
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