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Soft X-ray double-frequency gratings and manufacture method thereof

A dual-frequency grating and X-ray technology, applied in the scientific field, can solve the problems of ensuring consistency, many components, and low control accuracy, and achieve the effect of long service cycle and high production success rate.

Inactive Publication Date: 2012-07-04
UNIV OF SCI & TECH OF CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The disadvantages of this method are: 1. Use the grating to split the beam and combine the elements. The object light and the reference light pass through different paths, so it is difficult to adjust the optical path. Since the coherence length of X-rays is only 200um, it is difficult to adjust the equal optical path. 2. The middle element of the optical path There are many devices and are relatively complex, and the surface shape of the components will interfere with the interference fringes
Its control precision is low, and the quality of the dual-frequency grating is controlled by ion beam etching, and its application range is in the visible light band
The disadvantage of this method is: the diffraction efficiency of the two groups of gratings in the dual-frequency grating cannot be consistent in the process; when the method is used to manufacture the dual-frequency grating, the photoresist mask of the dual-frequency grating is directly obtained through holographic exposure, and the mask The accuracy of the mold is limited by the exposure amount of the photoresist. When making a dual-frequency grating with a shallow groove depth, the ideal photoresist groove pattern cannot be transferred to the quartz substrate.
However, this method cannot produce dual-frequency gratings with shallow groove depth and working in the X-ray band

Method used

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  • Soft X-ray double-frequency gratings and manufacture method thereof
  • Soft X-ray double-frequency gratings and manufacture method thereof
  • Soft X-ray double-frequency gratings and manufacture method thereof

Examples

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Embodiment 1

[0045] The cross-sectional view of the X-ray working grating is as follows: figure 2 (i) shown. Its grating groove structure is composed of two groups of rectangular groove gratings etched on the same quartz substrate, and the surface is plated with gold film.

[0046] In order to realize the above-mentioned dual-frequency grating structure, the present invention proposes a preparation method of the dual-frequency grating, including holographic exposure, ion beam etching, cleaning, further holographic exposure, ion beam etching, cleaning and coating processes. The specific production process is as figure 1 shown.

[0047] Its production steps are as follows:

[0048] Step 1. Coat photoresist on a quartz substrate whose surface shape is better than 1 / 10 wavelength and whose optical surface roughness is better than 0.5nm. figure 2 (a).

[0049] Step 2. Use a Kr ion laser with a wavelength of 0.4131 μm to perform holographic exposure method with a period of 1 μm, develop w...

Embodiment 2

[0060] Such as figure 1 , figure 2 As shown: (a) Coat photoresist 2 on a quartz substrate 1 with a size of 60mm×60mm×10mm and a surface shape better than 1 / 10 of the wavelength (wavelength is 632.8nm), with a thickness of 200nm, bake the glue, and temperature 85°C for 30 minutes. (b) Carry out the holographic exposure method to make a photoresist grating mask 3 with a period of 1 μm. After developing with a photoresist developer, dry it in an oven at a temperature of 110° C. for 30 minutes to obtain a double-frequency grating Photoresist relief pattern of the first set of gratings. (c) Etching the grating mask with an etching depth of 14 nm by using an ion beam etching machine. (d) Utilize acetone to clean the etched quartz substrate, and then use a volume ratio of 2:1 concentrated sulfuric acid: hydrogen peroxide (30%) to clean the quartz substrate to obtain a relief with a period of 1 μm and a depth of 14 nm Structured Quartz Grating Graphics. (e) Coating photoresist 4...

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Abstract

The invention provides double-frequency gratings capable of working on a soft X-ray wave band and a manufacture method thereof, which belong to the technical field of grating manufacture. Rectangular-groove gratings with two different frequencies are manufactured on the same substrate to form a double-frequency grating structure. The manufacture method of the structure adopts holographic exposure-ion-beametching technology for two times, and manufactures two groups of double-frequency gratings with similar frequencies. By means of the double-frequency grating structure and the manufacture method of the double-frequency grating structure, groove-shaped structures of each group of gratings can be accurately controlled so that the requirements of the soft X-ray wave band for accuracy of the grating groove shapes are met. The gratings can provide two light beams with a small included angle and identical light strength to perform self-shearing interference. The double-frequency grating structure and the manufacture method of the double-frequency grating structure solve the problem of manufacture of shearing elements in a soft X-ray wave band shearing interference system, and provide a key technology for utilizing a shearing method to diagnose plasma electronic density.

Description

technical field [0001] The present invention relates to the scientific fields of diffractive optics, holographic lithography, soft X-ray shearing interference, etc., and specifically relates to a soft X-ray dual-frequency grating and a manufacturing method thereof, which is a shearing grating working in a short wave band (soft X-ray band). Cutting interference element-soft X-ray dual-frequency holographic grating, which can be used in laser plasma density diagnosis, X-ray shearing interference system, etc. Background technique [0002] Prior art 1: (see document Jorge Filevich, Jorge J.Rocca, Mario C.Marconi, et al. "picosecond-resolution soft-x-ray laser plasma interferometry". Applied Optics, Vol.43, 3938-3946, 2004 ) for plasma diagnostics using a Mach-Zehnder (M-Z) interferometry system. The working principle of this method is simple, and the result processing is also relatively convenient. In interferometric diagnosis, after the probe laser beam is split by the gratin...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/18G21K1/06G03F7/00
Inventor 刘正坤邱克强刘颖徐向东付绍军
Owner UNIV OF SCI & TECH OF CHINA
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