Difunctional coated glass capable of reducing visible light reflection and reflecting near infrared ray and preparation method thereof
A technology of coated glass and near-infrared rays, applied in chemical instruments and methods, glass/slag layered products, layered products, etc., can solve the problems of high price and inability to use a single piece for a long time, and achieve low equipment cost and visible light Increased transmittance and broad prospects
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[0022] The preparation method of visible light anti-reflection / near-infrared reflection coated glass is characterized in that it comprises the following steps:
[0023] 1) First, the glass substrate to be coated is cleaned and dried.
[0024] 2) Then use the spraying method on the clean glass sheet at a temperature of 300-450°C or the dipping and pulling method on the clean glass sheet at room temperature to coat a single film layer or a double film layer respectively:
[0025] a) Prepare a spraying solution or dipping solution for plating a silicon dioxide isolation layer. The spraying solution or dipping solution is composed of organic silicon (such as tetraethyl orthosilicate), ethanol and water, and acid is used as a catalyst. The silicon dioxide in the liquid is The mass percentage after the content is converted into silicon dioxide is: 3-10%.
[0026] B) preparation is used for coating the spraying solution or dipping solution of transparent conductive semiconductor oxi...
example
[0032] The glass substrate to be coated is cleaned and dried; the size of the glass substrate is: 500×500×3.2, and the visible light transmittance is 91.60%.
example 1
[0034] Preparation of coated glass with visible light anti-reflection / near-infrared reflection double-functional composite film layer by spraying method, comprising the following steps:
[0035] 1) Prepare the spray solution. The silicon content in the first layer of spraying liquid is converted into the mass percentage of silicon dioxide: 3.0%. In the second layer of spraying liquid, the molar ratio of Sn and F is: Sn:F=1:0.1. In the third layer of spraying liquid, the silicon content converted into the mass percentage of silicon dioxide is: 3.0%.
[0036] 2) Under normal pressure, first heat the clean glass substrate to 300°C, then spray the first layer of spraying liquid containing silicon dioxide isolation layer, and then spray the second layer of transparent conductive semiconductor oxide on the first layer Spray the coating liquid, then spray the third layer of spray coating liquid containing the silicon dioxide film layer on the second layer, and finally heat-treat th...
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