Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Nanocrystalline nickel with high-density twin structure and preparation method thereof

A nanocrystalline, high-density technology, applied in the field of nanocrystalline nickel material and its preparation, can solve the problem of not giving the proportion and content of nanotwin structure, and achieve the effects of wide application, simple preparation process and fast deposition rate.

Inactive Publication Date: 2012-01-18
BEIJING UNIV OF TECH
View PDF8 Cites 17 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the nickel coating with the nano-twin structure can only be attached to the base material as a surface coating, and the invention patent does not give the proportion of the nano-twin structure to the entire coating material

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Nanocrystalline nickel with high-density twin structure and preparation method thereof
  • Nanocrystalline nickel with high-density twin structure and preparation method thereof
  • Nanocrystalline nickel with high-density twin structure and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] 1) Preparation of nano-twin crystal nickel material by electrolytic deposition technology

[0029] Electrolytic deposition equipment: DC electrolytic deposition power supply

[0030] Electrolyte ratio: 250 / L NiSO 4 +15g / L NiCl 2 +40g / L H 3 BO 3 Ionized water is used for distributing the electrolyte, and the acidity of the electrolyte is: pH=2.

[0031] Cathode and anode requirements: the anode is 99.97% pure nickel plate, and the cathode is stainless steel plate after degreasing treatment.

[0032] 2) Electrolysis process parameters: DC current density is 15A / dm 2, DC electroplating; the deposition time is 30min, the distance between cathode and anode is 15cm, and the area ratio of cathode and anode is 40:1; the electrolysis temperature is 25°C, and the electrolyte is stirred by electromagnetic stirring.

[0033] 3) A nickel material with nanoscale twin crystals is prepared. Figure 1 is an electron micrograph of the nano-twinned nickel material. The sample is comp...

Embodiment 2

[0035] 1) Preparation of nano-twin crystal nickel material by electrolytic deposition technology:

[0036] Electrolyte ratio: 350 / L NiSO 4 +10g / L NiCl 2 +30g / L H 3 BO 3 The acidity of the electrolyte is pH=2.5; the anode uses a pure nickel plate with a purity higher than 99.9%, the cathode uses a pure copper plate that has been pickled and degreased, and the area ratio of the anode and cathode is 30:1.

[0037] 2) Electrolysis process parameters: DC current density is 10A / dm 2 , DC electroplating; the deposition time is 15min, the distance between the cathode and the anode is 10cm, the electrolysis temperature is 20°C, and the electrolyte is stirred by electromagnetic means.

[0038] 3) Preparation of nickel material with nanoscale twin crystals, Figure 4 It is an electron micrograph of the nano-twinned nickel material. The sample is composed of nearly equiaxed submicron grains, and there are high-density twinned lamellar structures with different orientations inside the...

Embodiment 3

[0040] 1) Preparation of nano-twin crystal nickel material by electrolytic deposition technology:

[0041] Electrolyte ratio: 250g / L NiSO 4 +35g / LH 3 BO 3

[0042] The acidity of the electrolyte is pH=1; the anode is a 99.9% pure nickel plate, the cathode is a pure copper plate that has been pickled and degreased, and the area ratio of the anode and cathode is 50:1.

[0043] 2) Electrolysis process parameters: DC current density is 40A / dm 2 , DC electroplating; the deposition time is 30min, the distance between cathode and anode is 15cm, and the area ratio of cathode and anode is 50:1; the electrolysis temperature is 60°C, and the electrolyte is stirred by electromagnetic stirring.

[0044] Under this process, nickel materials with a grain size between 20nm and 300nm and a twin-lamellar thickness between 20nm and 50nm can also be prepared. In the sample, the grains with the twin-lamellar structure account for 100% of the entire sample.

[0045] The sample has a yield stre...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Average grain sizeaaaaaaaaaa
Thicknessaaaaaaaaaa
Yield strengthaaaaaaaaaa
Login to View More

Abstract

The invention relates to a preparation method of a nanocrystalline bulk metallic material, in particular to nanocrystalline nickel with a high-density twin structure and a preparation method thereof. The nickel material with the high-density twin structure prepared by direct current electrodeposition technology comprises grains with the thickness of from 20 nm to 500 nm in a microstructure, wherein each nano-crystal comprises a high-density twin lamella structure, and the thickness of each twin lamella is 10 nm to 200 nm, and the length of each twin lamella penetrates through the whole grain; and the grain with the twin lamella structure accounts for 50% to 100% of the whole sample grains. Compared with the prior art, the nanocrystalline nickel with the twin structure has excellent mechanical properties, the room-temperature tensile yield strength can be up to 1.6GPa to 2.0GPa, the breaking strength is 1.9GPa to 2.29GPa, the fracture elongation can be up to 6.5%, the nano-indentation hardness can be up to 3.3GPa to 3.8GPa, and the nano-indentation modulus of elasticity is 150GPa to 240GPa.

Description

technical field [0001] The invention relates to a nanocrystalline bulk metal material, in particular to a nanocrystalline nickel material with a high-density twin crystal structure and a preparation method thereof. Background technique [0002] Traditional material strengthening techniques, such as strain strengthening, solid solution strengthening, phase transformation strengthening, grain refinement strengthening, and second phase dispersion strengthening, mostly use ordinary non-coherent grain boundaries or phase boundaries to hinder dislocation movement to improve strength. When a large number of incoherent grain boundaries are introduced into the material, the strength is significantly improved (for example, the strength of nanocrystalline materials is an order of magnitude higher than that of coarse crystal materials), but with the increase of dislocation movement "blockers" (ie, incoherent grain boundaries) Increasingly, the movement of lattice dislocations is severel...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C25D3/12C25D5/18C25D5/22
Inventor 张跃飞成宇浩韩晓东张泽
Owner BEIJING UNIV OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com