Dielectric material of plasma display screen,manufacturing method of lower base plate of plasma display screen and plasma display screen
A technology of plasma display screen and dielectric material, applied in the field of dielectric materials, can solve the problem of low luminous efficiency of plasma display screen, and achieve the effects of increasing effective luminous area, increasing luminous area and high luminous efficiency
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Embodiment 1
[0036] Fabricate the lower substrate in the following manner: use printing, drying, exposure, development and sintering to complete the fabrication of the addressing electrodes on the display glass substrate, so that the width of the addressing electrodes is appropriately increased below the corresponding Y electrodes; above the addressing electrodes Make dielectric layers of different thicknesses; use printing or coating methods to prepare barrier layers, and use DFR filming, exposure, development, sandblasting, film stripping and sintering steps to make barriers; the glass substrates that have completed barrier ribs are made at 550°C-600°C Sintering at high temperature; use printing or spraying process to make phosphor coating.
[0037] Wherein, on the substrate on which the address electrodes have been completed, a dielectric layer with a thickness of about 30 microns is produced on the address electrodes by using a NEWLONG printing machine.
[0038] The above dielectric la...
Embodiment 2
[0042] The same procedure as in Example 1 was used to manufacture the plasma display panel lower substrate. Just, among them, used low melting point PbO-B in the dielectric layer of this embodiment 2 o 3 -SiO 2 - Glass powder of RO-based glass, wherein R is an alkali metal, and alumina as an inorganic filler powder. Wherein, based on the total weight of the low melting point glass powder and the inorganic filler, the content of PbO is about 30% by weight, B 2 o 3 The content is about 15% by weight, SiO 2 The content is about 25% by weight, Li 2 O+Na 2 O+K 2 The content of O was about 10% by weight, and the content of the inorganic filler powder was about 20% by weight.
[0043] The particle size distribution of the above-mentioned glass powder is: the 50% average particle size (D50) is 0.3-5 μm, and the maximum particle size (Dmax) is about 20 μm. The particle size distribution of the inorganic filler powder alumina is: the 50% average particle size (D50) is 10-20 μm,...
Embodiment 3
[0046] The same procedure as in Example 1 was used to manufacture the plasma display panel lower substrate. However, among them, PbO-B is used in the dielectric layer of this embodiment 2 o 3 -SiO 2 - Low-melting-point glass powder of RO-based glass, R is an alkali metal, and alumina as an inorganic filler powder. Wherein, based on the total weight of the low melting point glass powder and the inorganic filler powder, the content of PbO is about 35% by weight, B 2 o 3 The content is about 10% by weight, SiO 2 The content is about 26% by weight, Li 2 O+Na 2 O+K 2 The content of O was about 14% by weight, and the content of the inorganic filler powder was about 15% by weight.
[0047] The particle size distribution of the above-mentioned glass powder is: the 50% average particle size (D50) is 0.3-5 μm, and the maximum particle size (Dmax) is about 20 μm. The particle size distribution of the inorganic filler powder alumina is: the 50% average particle size (D50) is 10-2...
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