Patterned composite film preparation method for reinforcing photo-absorption of titanium dioxide film
A composite film and patterning technology, applied in photovoltaic power generation, final product manufacturing, sustainable manufacturing/processing, etc., to achieve the effect of complete pattern, expanded light absorption wavelength range, and high selectivity
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Embodiment 1
[0020] 1) TiO 2 Preparation of the film: First, immerse the glass substrate in anhydrous methanol solution of 5mM 3-aminopropyltriethoxysilane (APTS), assemble at room temperature for 3h, take it out, wash it with anhydrous methanol and secondary water successively, and blow it with nitrogen. dry; then take 0.06g Ti(SO 4 ) 2 , 0.058g H 2 o 2 and water to form a precursor solution, and adjust the pH value to about 1.6; then place the glass substrate with APTS on the surface in the precursor solution, and deposit at 80°C for 20min.
[0021] 2)-CH 3 / -NH 2 -Construction of SAMs patterned surface: firstly, the TiO produced in step (1) 2 The nanofilm was placed in a n-hexane solution of 5 mM octadecyltrichlorosilane (OTS), assembled at room temperature for 1 hour, cleaned with n-hexane after taking it out, and blown dry with nitrogen. Then TiO with OTS on the surface 2 Place a mask on the nanofilm and irradiate with ultraviolet light for 10 minutes. During the process of li...
Embodiment 2
[0024] 1) TiO 2 Preparation of the film: First, immerse the glass substrate in anhydrous methanol solution of 5mM 3-aminopropyltriethoxysilane (APTS), assemble at room temperature for 3h, take it out, wash it with anhydrous methanol and secondary water successively, and blow it with nitrogen. dry; then take 0.06g Ti(SO 4 ) 2 , 0.058g H 2 o 2 and water to form a precursor solution, and adjust the pH value to about 1.6; then place the substrate with APTS on the surface in the precursor solution, and deposit at 70°C for 1h.
[0025] 2)-CH 3 / -NH 2 - Construction of SAMs patterned surface:
[0026] The method is the same as example 1.
[0027] 3) Cu 2 Preparation of S patterned thin film: 0.25g CuSO 4 .5H 2 O, 0.558g EDTA was dissolved in 50mL of water to form a transparent and clear solution, and 1M H 2 SO 4 Adjust the pH to 2.0, then add 0.248 g of Na2 S 2 o 3 , after mixing evenly, put the patterned SAMs substrate into the solution for deposition at 70°C twice, ea...
Embodiment 3
[0029] 1) TiO 2 Film preparation:
[0030] The method is the same as example 1.
[0031] 2)-CH 3 / -NH 2 - Construction of SAMs patterned surface:
[0032] The method is the same as example 1.
[0033] 3) Cu 2 Preparation of S patterned thin film: 0.125g CuSO 4 .5H 2 O, 0.279g EDTA was dissolved in 50mL of water to form a transparent and clear solution, and 1M H 2 SO 4 Adjust the pH to 1.5, then add 0.248 g of Na 2 S 2 o 3 , after mixing evenly, put the patterned SAMs substrate into the solution to deposit twice at 70°C, each time for 40 minutes. After the substrate was taken out, it was rinsed with water twice, then ultrasonically cleaned for 5 min, and dried with nitrogen, and finally the Cu 2 The S film was sintered at 300°C under the protection of nitrogen.
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