Complementary metal-oxide-semiconductor (CMOS) ring oscillator based on mixed crystal orientation silicon on insulator (SOI) technology and manufacturing method thereof
A ring oscillator and mixed crystal orientation technology are applied in the CMOS ring oscillator and its preparation, and the CMOS ring oscillator based on the mixed crystal orientation SOI process and its preparation field can solve the problems of reducing the circuit integration density and the like.
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[0038] The device structure of the present invention will be further described below in conjunction with the accompanying drawings, which are not drawn to scale for the convenience of illustration.
[0039] This embodiment provides a CMOS ring oscillator based on a mixed crystal orientation SOI process, which includes: an SOI substrate and a CMOS device fabricated on the SOI substrate. The CMOS devices include: NMOS devices and PMOS devices. Wherein, the channel of the NMOS device adopts (100) crystal plane silicon, and the channel of the PMOS device adopts (110) crystal plane silicon.
[0040] Since the (110) crystal plane PMOS carrier hole mobility is much higher than that of the traditional (100) crystal plane, depending on the epitaxial quality of the (110) crystal plane, the hole mobility in the (110) crystal plane is the same as that of the (100) crystal plane. 1.5 to 3 times of that, therefore, the channel adopts the PMOS device of (110) crystal plane, can reduce the c...
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