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Cleaning agent composite used after computer hard disk substrate polishing

The technology of a cleaning agent and composition is applied in the field of surface cleaning and treatment of computer hard disks, and can solve the problems of heavy surface roughness and excessive corrosion.

Active Publication Date: 2012-07-04
SHANGHAI UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] At present, in the integrated circuit industry, the cleaning technology after CMP polishing is mainly the standard RCA cleaning method relying on cleaning agents such as strong acid, strong alkali, and strong oxidizing agent. These cleaning agents are used in Computer hard disk substrate cleaning, due to strong corrosion, will cause the surface to become rough after polishing, etc.

Method used

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  • Cleaning agent composite used after computer hard disk substrate polishing
  • Cleaning agent composite used after computer hard disk substrate polishing

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0020] Embodiment one: in the present embodiment, the composition and the weight percent of the cleaning agent on the computer hard disk substrate surface after polishing are as follows:

[0021] Surfactant Lauryl Polyethylene Glycol 12%

[0022] ZETA potential regulator alkyl polyoxyethylene ether polyquaternary ammonium salt 5.0%

[0023] Corrosion inhibitor mercaptothiazole sodium salt 0.6%

[0024] Sodium hydroxide 0.4%

[0025] Deionized water 82%

[0026] Preparation of cleaning agent: Under mechanical stirring, add surfactant, zeta potential regulator, corrosion inhibitor, and alkali into deionized water in sequence, stir and dissolve evenly, and the obtained transparent liquid is obtained.

[0027] After the above cleaning agent is diluted with deionized water at a ratio of 1:50, the polished Ni-P plated computer hard disk substrate is ultrasonically cleaned, the ultrasonic frequency is 100KHz, and the time is 10 minutes; the substrate is...

Embodiment 2

[0028] Embodiment two: In the present embodiment, the composition and weight percentage of the cleaning agent on the surface of the computer hard disk substrate after polishing are as follows:

[0029] Surfactant Lauryl Polyethylene Glycol 12%

[0030] ZETA Potential Regulator Alkyl Polyoxyethylene Ether-Phosphate Copolymer 5.0%

[0031] Corrosion inhibitor Hydroxybenzotriazole 0.6%

[0032] Sodium hydroxide 0.4%

[0033] Deionized water 82%

[0034] The cleaning agent preparation, cleaning process and surface detection process in this embodiment are the same as those in the above-mentioned embodiment 1. See the test results figure 1 .

Embodiment 3

[0035] Embodiment three: In the present embodiment, the composition and weight percentage of the cleaning agent on the surface of the computer hard disk substrate after polishing are as follows:

[0036] Surfactant Pingping plus O-20 12%

[0037] ZETA potential regulator polyoxyethylene ether sulfonate copolymer 5.0%

[0038] Corrosion inhibitor Hydroxybenzotriazole 0.6%

[0039] Sodium hydroxide 0.4%

[0040] Deionized water 82%

[0041] The cleaning agent preparation, cleaning process and surface detection process in this embodiment are the same as those in the above-mentioned embodiment 1. See the test results figure 1 .

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Abstract

The invention relates to a cleaning agent composite used after computer hard disk polishing. The invention is characterized in that the cleaning agent contains ZETA potential regulator; the cleaning agent composite comprises the following components by weight percent: 5-15% of surfactant, 2-8% of ZETA potential regulator, 0.2-1.5% of corrosion inhibitor and 0.2-2% of alkaline sodium hydroxide or ammonia water and the balance of deionized water. The cleaning solution composite provided by the invention is applicable to ultraprecise cleaning solution for the surface of a computer hard disk substrate after chemically mechanical polishing, and surface smoothness and cleanness of the substrate can be improved.

Description

technical field [0001] The present invention relates to a kind of cleaning agent composition that computer hard disk substrate is used after polishing, especially a kind of cleaning liquid composition that is used for the polished surface of computer hard disk substrate of Ni-P plating, and this cleaning liquid composition can effectively Reduce the residual particles on the surface, and there is basically no corrosion on the surface of the hard disk substrate. . The invention belongs to the technical field of computer hard disk surface cleaning treatment. Background technique [0002] In recent years, with the rapid increase of memory hard disk capacity and storage density and the emergence of vertical storage technology, the flying height of computer heads has been reduced to below 7-8 nm. As the head and disk run so close, the requirements for the flatness and cleanliness of the disk surface are getting higher and higher. If the surface roughness and waviness of the ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23G1/00
Inventor 雷红
Owner SHANGHAI UNIV
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