Method and system for preparing filter membrane mesh structure by laser interference photoetching technology

Abstract

The invention discloses a method and a system for preparing a filter membrane mesh structure by laser interference photo-etching technology. The system can generate images with different intervals by different exposure methods of the laser interference photo-etching technology. A photoetched image is generated by regulating and controlling light intensity distribution in an interference field by a specified light beam combination method, and ablating the surface of a processed material by using modulated redistributed laser energy. The system consists of a laser, a beam expander, a beam splitter, a reflecting mirror, a polaroid and a mechanism for clamping and regulating the optical elements and devices. By changing the relative arrangement position of the optical devices, an incident angle of a related light beam which is irradiated on the surface of a substrate material is changed so as to regulate parameters of a micro-mesh structure of the surface of the processed material. The system can realize adjustability of photo-etching characteristic sizes from nanometers to hundreds of microns. By optical phase shifting or mechanical shifting of a sample, repeated exposure or repeated exposure interpolation, a high-density micro-nano filter membrane mesh structure can be prepared.

Description

technical field [0001] The invention relates to a method and a system for manufacturing a filter membrane mesh structure, in particular to a method and a system for manufacturing a filter membrane mesh structure based on laser interference lithography technology. technical background [0002] Laser interference lithography uses the interference characteristics of light, and different exposure methods will produce patterns with different apertures and spacing between holes. The light intensity distribution in the interference field is regulated by a specific beam combination method, and the modulated and redistributed laser energy is used to ablate the surface of the processed material to produce a photolithographic pattern. Interference lithography does not require masks and expensive lithographic imaging lenses, thus providing the possibility of high-resolution, infinite depth of focus, and large-area lithography. It is especially suitable for the generation of periodic ul...

AI Technical Summary

Problems solved by technology

The above methods for making the mesh structure of the filter membrane are all directly prepared by chemical and physical methods, which makes the parameters of the mesh structure poorly controllable, and the manufacturing process is complicated or the cost is high.

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