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Surface cleaning method after carrying out chemical-mechanical polishing (CMP) on lithium niobate wafer in alkalinity

A technology of lithium niobate and the back surface, which is applied in the direction of cleaning methods using liquids, cleaning methods and utensils, chemical instruments and methods, etc., can solve problems such as high surface tension, high wafer surface energy, and contamination of metal ions, etc., to achieve Effects of improving uniformity, reducing damaged layers, and improving perfection

Inactive Publication Date: 2011-02-16
HEBEI UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The present invention aims to solve the known problems of high wafer surface energy, high surface tension, uneven distribution of residual polishing fluid, contamination of metal ions and the like after CMP of lithium niobate wafers, and discloses a simple and pollution-free lithium niobate wafer Post-CMP Surface Cleaning Methods

Method used

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  • Surface cleaning method after carrying out chemical-mechanical polishing (CMP) on lithium niobate wafer in alkalinity
  • Surface cleaning method after carrying out chemical-mechanical polishing (CMP) on lithium niobate wafer in alkalinity
  • Surface cleaning method after carrying out chemical-mechanical polishing (CMP) on lithium niobate wafer in alkalinity

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Experimental program
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Effect test

Embodiment 1

[0025] Embodiment 1: prepare 2000g lithium niobate crystal water-soluble surface cleaning liquid

[0026] Take 1800g of deionized water, put in 50g of FA / O surfactant and 40g of FA / O chelating agent while stirring, then weigh 10g of hexamethylenetetramine corrosion inhibitor, dilute it with 100g of deionized water and pour it into the above-mentioned mixture while stirring. liquid. After stirring evenly, 2000g of silicon water-soluble surface cleaning solution is obtained, and the flow rate of 2000g / min is used for water polishing for 60s, and the surface is smooth and free of corrosion.

Embodiment 2

[0027] Embodiment 2: preparation 4000g lithium niobate crystal water-soluble surface cleaning liquid

[0028] Get deionized water 3700g, put into Oπ-7 ((C 10 h 21 -C 6 h 4 -O-CH 2 CH 2 O) 7 -H) 70g of surfactant, 60g of FA / O chelating agent, and then weigh 70g of benzotriazole corrosion inhibitor, dilute with 100g of deionized water, and pour into the liquid while stirring. After stirring evenly, 4000g of silicon water-soluble surface cleaning solution was obtained. After water polishing at a flow rate of 4000g / min, the surface was smooth and free of corrosion.

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Abstract

The invention relates to a surface cleaning technique after lithium niobate chemical-mechanical polishing liquor is used to precisely finish and polish a lithium niobate wafer. Water polishing is adopted to achieve the clean of the surface, the main chemical components of water polishing liquor comprise an active agent, a chelant, a corrosion resistance agent and deionized water. After alkaline polishing is just completed, the water polishing liquor is immediately used and a method of large flow amount of water polishing is adopted, thereby washing the residual polishing slurry away and simultaneously rapidly reducing surface tension, forming a monomolecular passive film and leading metal ions to form soluble chelate to cleanly and perfectly polish the surface. The water polishing method has the advantages of low cost, no pollution of environment and no corrosion of equipment.

Description

technical field [0001] The invention belongs to the cleaning technology of wafer surface after CMP, in particular to the technology of obtaining clean surface after basic CMP of lithium niobate crystal. Background technique [0002] Lithium niobate crystal is a rare artificial crystal like single crystal silicon. Because of its ferroelectric, piezoelectric, pyroelectric, electro-optic, acousto-optic and photorefractive effects, it is widely used in the production of various surface acoustic wave, electro-optic and nonlinear optical devices. In recent years, with the improvement of rare earth doping engineering, domain engineering and near-stoichiometric crystal growth and post-processing technology, the LiNbO 3 Waveguide, LiNbO 3 The research on the function and performance of optoelectronic and photonic devices has increased dramatically, making it possible to become an optical silicon material for key components in the fields of optical communication, military confrontat...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B3/08
Inventor 刘玉岭檀柏梅孙鸣
Owner HEBEI UNIV OF TECH
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