Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for preparing nanometer silicon dioxide

A nano-silicon dioxide, silicon dioxide technology, applied in the directions of silicon dioxide, silicon oxide, nanotechnology, etc., can solve the problems of large modifiers, adverse effects on product performance, increased cost, etc., and achieves low drying temperature and high drying temperature. Practical value, low cost effect

Inactive Publication Date: 2010-09-01
HUNAN UNIV OF TECH
View PDF0 Cites 16 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, most nano-SiO 2 The modification is to synthesize nano-SiO 2 , after modifying nano-SiO by dry or wet method 2 , dry modified nano-SiO 2 A large amount of modifier is required, and some modifiers are not grafted to nano-SiO 2 On the surface, it has adverse effects on the performance of the product, and wet modification of nano-SiO 2 A large amount of solvent is required, resulting in the production of nano-SiO 2 The cost increases, and the waste liquid needs to be treated, which is not suitable for the current environment-friendly and energy-saving requirements. Nano-SiO 2 Modification during synthesis can simplify the process and reduce production costs

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for preparing nanometer silicon dioxide
  • Method for preparing nanometer silicon dioxide
  • Method for preparing nanometer silicon dioxide

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] Dissolve 280g of sodium silicate in a mixture of 1600ml of deionized water and 400ml of absolute ethanol as solution A; a certain amount of 20% hydrochloric acid solution as solution B; 320ml of 20% sodium chloride solution as solution C; at room temperature Next, pour the prepared reaction solution into the barrel respectively, and feed the material into the self-made reaction device at a certain speed according to the parallel flow of four feeding pipes, and at the same time, feed gas into the reaction device through the inlet pipe (gas flow 4KPa) , high-speed stirring (6000r / min) and control the pH of the reaction system = 8 ~ 9, synthesize nano-SiO in a composite shear force field 2 . Continue stirring for 10 minutes after the simultaneous addition of the reaction solution, pour the milky white reaction solution into a beaker to settle, age for 24 hours, filter with suction, wash until there is no chloride ion, and then vacuum dry at 90°C for 24 hours to obtain whit...

Embodiment 2

[0027] On the basis of Example 1, 60 ml of 20% polyethylene glycol was added in the C liquid, and other conditions and implementation methods were the same as in Example 1. Preparation of Nano-SiO Modified by Surfactant Polyethylene Glycol 2 .

Embodiment 3

[0029] On the basis of Example 1, 15 g / L of hydrolyzed silane coupling agent KH570 was used as D liquid; at the same time, it was fed in parallel, and other conditions and implementation methods were the same as in Example 1. Preparation of Nano-SiO Modified by Coupling Agent 2 .

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
particle sizeaaaaaaaaaa
particle sizeaaaaaaaaaa
particle sizeaaaaaaaaaa
Login to View More

Abstract

The invention relates to a method for preparing nanometer SiO2. The method prepares the nanometer SiO2 by adopting composite shearing force field and comprises the following steps of: 1, using solution of sodium silicate as solution A, precipitator as solution B, mixed solution of surfactant and sodium chloride as solution C, and modifier as solution D; 2, pouring the prepared reaction solution A, B, C and D into a feed barrel at room temperature, introducing gas to the feed barrel, and controlling the pH value of a reaction system to perform reaction with stirring of a composite shearing force field; 3, precipitating ivory reaction solution, aging for 24 hours, filtering and washing till no chloridion, and drying to obtain silicon dioxide; and 4, grinding and sieving to obtain a sample. The method has the advantages of low cost of raw materials, simple structures of reaction devices, little investment, simple and feasible process, high yield and realization of large-batch production, can be performed at room temperature, can be widely used in plastic, rubber, adhesive, dope, ink and other products, and has extremely high practical value.

Description

technical field [0001] The invention relates to the preparation technology of silica powder, in particular to a method for preparing pure nano-silica or organically modified nano-silica with small and uniform particle size under a compound shear force field. Background technique [0002] nano-SiO 2 It is a non-toxic and non-polluting white powder. Due to its small particle size, large specific surface area and a large number of hydroxyl groups on the surface, it exhibits excellent reinforcement, stability, thickening and thixotropy. It is used in plastics, rubber, adhesives, Coatings and other fields have been widely used. At present, the preparation of nano-SiO 2 There are many methods, mainly dry and wet. The dry method includes gas phase decomposition method and arc method, and the wet method includes chemical precipitation method, microemulsion method, sol-gel method and vacuum condensation method. Nano-SiO prepared by dry method, microemulsion method and sol-gel met...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/18B82B3/00
Inventor 刘跃军刘亦武阙永生魏珊珊
Owner HUNAN UNIV OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products