Radiation-sensitive resin composition, interlayer insulating film and microlens, and method for forming the same
A resin composition and ray-sensing technology, which are applied in the photoengraving process of lenses, pattern surfaces, and photosensitive materials for opto-mechanical equipment, etc., can solve the problem of not involving acrylates, etc. Effects of dielectric constant, excellent solvent and heat resistance, high radiation sensitivity
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[0073] Among the solvents used in the preparation of the copolymer [A], ethylene glycol alkyl ether acetate, diethylene glycol dialkyl ether, propylene glycol monoalkyl ether, propylene glycol alkyl ether acetate, 3-methanol Methyl oxypropionate. Among these solvents, diethylene glycol dimethyl ether, diethylene glycol ethyl methyl ether, propylene glycol methyl ether, propylene glycol ethyl ether, propylene glycol methyl ether acetate, methyl 3-methoxypropionate .
[0074] As the polymerization initiator used in the preparation of the copolymer [A], a polymerization initiator generally known as a radical polymerization initiator can be used. Specific examples of the polymerization initiator include 2,2'-azobisisobutyronitrile, 2,2'-azobis-(2,4-dimethylvaleronitrile), 2,2'-azobis Azo compounds such as bis-(4-methoxy-2,4-dimethylvaleronitrile); benzoyl peroxide, lauroyl peroxide, tert-butyl peroxypivalate, 1,1'- organic peroxides such as bis(tert-butylperoxy)cyclohexane; and...
Synthetic example 1
[0141] Synthesis of Synthesis Example 1 Copolymer [A-1]
[0142] Into a flask equipped with a cooling tube and a stirrer, 7 parts by mass of 2,2'-azobis(2,4-dimethylvaleronitrile) and 200 parts by mass of diethylene glycol ethyl methyl ether were added. Continue to add 16 mass parts of methacrylic acid, 16 mass parts of methacrylic acid tricyclic [5.2.1.0 2,6 ]decane-8-yl ester, 20 parts by mass of 2-methylcyclohexyl acrylate, 40 parts by mass of glycidyl methacrylate, 10 parts by mass of styrene and 3 parts by mass of α-methylstyrene dimer, After replacing with nitrogen, stirring was started slowly. The temperature of the solution was raised to 70° C., and the temperature was maintained for 4 hours to obtain a polymer solution containing copolymer [A-1]. The polystyrene conversion weight average molecular weight (Mw) of copolymer [A-1] was 8000, and molecular weight distribution (Mw / Mn) was 2.3. In addition, the solid content concentration of the polymer solution prepared ...
Synthetic example 2
[0143] Synthesis of Synthesis Example 2 Copolymer [A-2]
[0144]Into a flask equipped with a cooling tube and a stirrer, 8 parts by mass of 2,2'-azobis(2,4-dimethylvaleronitrile) and 220 parts by mass of diethylene glycol ethyl methyl ether were added. Continue to add 11 parts by mass of methacrylic acid, 12 parts by mass of tetrahydrofurfuryl methacrylate, 40 parts by mass of glycidyl methacrylate, 15 parts by mass of N-cyclohexylmaleimide, 10 parts by mass of methacrylic acid Lauryl ester, 10 parts by mass of α-methyl-p-hydroxystyrene, and 3 parts by mass of α-methylstyrene dimer were replaced with nitrogen, and then slowly stirred. The temperature of the solution was raised to 70° C., and the temperature was maintained for 5 hours to obtain a polymer solution containing the copolymer [A-2]. The polystyrene equivalent weight average molecular weight (Mw) of copolymer [A-2] was 8000, and molecular weight distribution (Mw / Mn) was 2.3. In addition, the solid content concentra...
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