Roll-to-roll plasma device for enhancing chemical vapor deposition

A plasma and vapor deposition technology, applied in gaseous chemical plating, metal material coating process, coating and other directions, can solve the problems of unevenness and inaccessibility, improve quality, improve operation efficiency, reduce surface unevenness, etc. The effect of flattening

Inactive Publication Date: 2010-01-20
SHUANGDENG GRP
View PDF0 Cites 19 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For flexible substrates, due to the thermal shrinkage effect and variable characteristics under heating, if there is no external force to give a certain balance tension control, flexible substrates such as polymer substrates will be deflected, resulting in the failure of coating or serious damage to the coating. Inhomogeneity
In addition, for flexible substrates, due to their softness and variability, if the technology that usually deals with rigid substrates is used, many difficulties will be encountered in practice and the required effects will not be achieved.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Roll-to-roll plasma device for enhancing chemical vapor deposition
  • Roll-to-roll plasma device for enhancing chemical vapor deposition
  • Roll-to-roll plasma device for enhancing chemical vapor deposition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0035] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.

[0036] Such as Figure 1-5 shown.

[0037] A roll-to-roll plasma-enhanced chemical vapor deposition device, which mainly consists of the following parts (such as figure 1 shown):

[0038] A roll-out roller 2, the roll-out roll 2 is wound with a strip-shaped flexible base material that is unwound, and the roll-out roll 2 is installed in the vacuum chamber 1;

[0039] A winding roller 11, the winding roller 11 rewinds the flexible base material unwound by the aforementioned unwinding roller 2 into rolls in a roll-to-roll manner, and the winding roller 11 is installed in the vacuum chamber 22;

[0040] A heating chamber 15, one end of the heating chamber 15 is connected with the vacuum chamber 1, and the other end is connected with the deposition chamber 10, and one end of the deposition chamber 10 is connected with the vacuum chamber 22, a heating devi...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to a roll-to-roll plasma device for enhancing chemical vapor deposition, which is characterized in that the device comprises a roll-out roller (2), a winding roller (11), a heating cavity (15), a vertical transmission rail (3), a rail (16), tension pulley groups (4,6,13) and a cooling roller (12), wherein the rail (16) connected with a horizontal transmission rail (20) and arranged in a vacuum chamber (22) is used for feeding deposited flexible matrix material into the winding roller (11); the tension pulley groups (4,6,13) are respectively arranged in a vacuum chamber (1), the vacuum chamber (22) and the heating chamber (15) and used for keeping the tensile force of the matrix material in the transmission process, and the cooling roller (12) is arranged in the vacuum chamber (22) and used for cooling the deposited flexible matrix material loaded on the winding roller (11). The device greatly improves the transport efficiency of the flexible matrix in the vacuum cavity, furthermore accurately controls the surface tension of the matrix at high temperature conveniently, and greatly reduces the phenomenon of uneven surface of the flexible matrix caused by thermal contraction at high temperature.

Description

technical field [0001] The invention relates to a chemical deposition device, in particular to a flexible substrate, such as a chemical deposition device on substrates such as stainless steel, polymers and fibers, specifically a roll-to-roll plasma enhanced chemical vapor deposition device, It can also be used to prepare silicon-based thin film solar cells. Background technique [0002] As we all know, the roll-to-roll device is a new type of equipment widely used in industrial production. As the world enters a new era of rapid development of electronic information and new energy industries. It has become a new type of high-efficiency production equipment for these emerging high-tech industries, such as in the field of printed circuit boards, the field of flexible matrix solar cells, and the field of flexible and convenient electronic devices. With its simple preparation process, the production efficiency in these fields can be greatly improved, and the production cost of t...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C23C16/54C23C16/50
Inventor 郝三存邵双喜李丹段和勋
Owner SHUANGDENG GRP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products