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Continuous film forming apparatus

A film-forming roller and plasma technology, which is applied in the direction of gaseous chemical plating, coating, electrical components, etc., can solve the problems of film-forming stability damage, sealing effect change, and protective film quality stability decline

Active Publication Date: 2009-12-23
KOBE STEEL LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, since the protective film is also deposited near the gap, the sealing effect of the gas in the discharge chamber changes, the stability of film formation is impaired, and the stability of the quality of the protective film decreases.

Method used

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Embodiment Construction

[0021] In the plasma CVD apparatus of the present invention, AC or pulse voltage accompanied by polarity inversion is applied to the film-forming rollers arranged oppositely under reduced pressure. (zone)) to generate a glow discharge, and to form a film by plasma CVD on a tape-shaped base material that is wound up facing the facing space of the film-forming rollers. As the base material, any material can be used as long as it is an insulating material that can be wound in a roll shape, such as a plastic film or sheet, or paper. PET, PEN, PES, polycarbonate, polyolefin, polyimide, etc. are suitable as a plastic film or sheet, and the thickness of the substrate is preferably 5 μm to 0.5 mm that can be transported in a vacuum. In addition, as will be described later, a conductive material can be used as the base material depending on the configuration of the device.

[0022] figure 1 The overall structure of the plasma CVD apparatus according to the embodiment of the present i...

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Abstract

A continuous film forming apparatus comprises a pair of film forming rolls (2, 3) where winding substrates (S) are arranged opposite to each other in parallel, magnetic field generation members (12, 13) provided in respective film forming rolls (2, 3) and generating a magnetic field for converging plasma to the vicinity of the roll surface facing the opposing space (5) between the film forming rolls, a plasma power supply (14) where the polarity of one and the other electrodes is inverted alternately, a gas supply pipe (8) for supplying a film froming gas to the opposing space (5), and a means for vacuum pumping the opposing space (5). The plasma power supply (14) has one electrode connected with one film forming roll (2), and the other electrode connected with the other film forming roll (3).

Description

technical field [0001] The present invention relates to a plasma CVD apparatus for continuously forming a functional protective film on the surface of a tape-shaped substrate such as a plastic film or sheet. Background technique [0002] In recent years, various display substrates using plastic films or sheets as base materials have been proposed, and barrier properties against water vapor or oxygen are required for the substrates. In order to impart such barrier properties, a transparent SiOx protective film may be coated on a base material, and a coating unit with high productivity is desired. As a technique for coating the SiOx protective film during the process of conveying the base material from roll to roll, there are, for example, physical vapor deposition (PVD) methods such as vacuum evaporation and sputtering, or plasma CVD (Plasma CVD). Enhanced-Chemical Vapor Deposition) method. [0003] The vacuum evaporation method is widely used as a high-productivity process...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/54C23C16/50
CPCC23C16/50C23C16/545H01J37/32018H01J37/32577H01J37/32669H01J37/32752H01J37/32761H01J37/3277C23C16/54
Inventor 玉垣浩
Owner KOBE STEEL LTD
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