Rapid-annealing method for growing large-size sapphire single-crystal with SAPMAC method
A technology of pulling method and sapphire, applied in the directions of self-melt pulling method, single crystal growth, crystal growth, etc., can solve the problems of increasing production cost and prolonging annealing time, so as to prevent crystal cracking and reduce crystal dislocation density , obvious social and economic benefits
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Embodiment 1
[0027] In this embodiment, the sapphire single crystal is grown by the cold-heart shoulder micro-pulling method. After the growth is completed, the vacuum degree in the crystal growth furnace is maintained, and the vacuum degree is 10 at this time. -4 Pa, reduce the heating voltage, so that the temperature in the crystal growth furnace drops at a rate of 25°C / h. After the temperature in the furnace drops to 1700°C, keep the temperature constant for 4 hours; continue to reduce the heating voltage, so that the temperature in the crystal growth furnace decreases to Decrease at a rate of 20°C / h. After the temperature in the crystal growth furnace drops to 1100°C, keep the temperature constant for 2 hours; continue to reduce the heating voltage so that the temperature in the crystal growth furnace drops at a rate of 15°C / h; After the internal temperature drops to 600°C, continue to reduce the heating voltage, so that the temperature in the crystal growth furnace drops at a rate of 2...
Embodiment 2
[0029] In this embodiment, the sapphire single crystal is grown by the cold-heart shoulder micro-pulling method. After the growth is completed, the vacuum degree in the crystal growth furnace is maintained, and the vacuum degree is 10 at this time. -4 Pa, reduce the heating voltage, so that the temperature in the crystal growth furnace drops at a rate of 20°C / h. After the temperature in the furnace drops to 1700°C, keep the temperature constant for 8 hours; continue to reduce the heating voltage, so that the temperature in the crystal growth furnace decreases to Decrease at a rate of 15°C / h. After the temperature in the crystal growth furnace drops to 1100°C, keep the temperature constant for 4 hours; continue to reduce the heating voltage so that the temperature in the crystal growth furnace drops at a rate of 10°C / h; After the internal temperature drops to 600°C, continue to reduce the heating voltage, so that the temperature in the crystal growth furnace drops at a rate of 1...
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