Process for manufacturing amorphous silicon thin film solar cell
A technology for amorphous silicon thin films and solar cells, applied in sustainable manufacturing/processing, final product manufacturing, metal material coating technology, etc., can solve low electrical conductivity, unstable performance of amorphous silicon solar cells, lattice loss Matching problem
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Embodiment 1
[0019] Single-junction amorphous silicon thin-film solar cells were fabricated in a multi-chamber flat plate capacitive plasma-enhanced chemical vapor deposition system. Vacuum the deposition chamber to a vacuum higher than 1×10 -5 Pa, the deposition temperature is heated to 190°C, and the RF power is 0.4W / cm 2 . The p-layer silicon-carbon film is prepared in the p chamber, and the hydrogen dilution ratio is R=100:1.1 (R=H 2 / SiH 4 ), the flow ratio of silane to methane is 10:1, and the deposition pressure is 100pa to prepare a thin film with a thickness of about 20nm. After the boron-doped silicon carbon layer is prepared, the substrate is transferred to chamber I. The buffer layer and the hydrogenated amorphous silicon intrinsic layer are prepared in the same chamber. The buffer layer is deposited using a high hydrogen dilution ratio R 1 =50(R 1 =H 2 / SiH 4 ) to prepare a non-carbon-doped silicon buffer layer, the deposition temperature is 190°C, and the radio frequen...
Embodiment 2
[0021] Using transparent conductive glass as the substrate, the glass substrate is preheated to 180°C, and then sent to a multi-chamber flat-panel capacitive plasma-enhanced chemical vapor deposition system to prepare single-junction amorphous silicon thin-film solar cells. Vacuum the deposition chamber to a vacuum higher than 1×10 -5 Pa, the deposition temperature is heated to 190°C, and the RF power is 0.4W / cm 2 . The p-layer nano silicon carbon is prepared in the p chamber, and the hydrogen dilution ratio is R=100:1.1 (R=H 2 / SiH 4 ), the flow ratio of silane to methane is 10:1, and the deposition pressure is 100pa to prepare a thin film with a thickness of about 20nm. After the boron-doped silicon carbon layer is prepared, the substrate is transferred to another chamber. The buffer layer and the hydrogenated amorphous silicon intrinsic layer are prepared in the same chamber. The buffer layer is deposited using a high hydrogen dilution ratio R 1 =50(R 1 =H 2 / SiH 4 )...
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