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Cathode substrate

A technology of substrate and negative electrode, which is applied in the direction of electrode manufacturing, battery electrodes, active material electrodes, etc., can solve the problems of poor adhesion between the negative electrode material layer and the current collector, and the inability to obtain charge-discharge cycle characteristics, etc., to achieve charge-discharge The effects of excellent cycle characteristics, high energy density, and high output voltage

Active Publication Date: 2009-05-20
TOKYO OHKA KOGYO CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when a negative electrode material layer formed by a thin-film negative electrode material is formed on a current collector formed of this material, there is a problem that the close adhesion between the negative electrode material layer and the current collector is not good, and satisfactory results cannot be obtained. Concerns about charge-discharge cycle characteristics

Method used

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  • Cathode substrate
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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0086] 100 parts by mass of multifunctional bisphenol A novolac epoxy resin "Epikote 157S70 (trade name, manufactured by Japan Epoxy Resin Co., Ltd.)", 5 parts by mass of diphenyl [4-(phenylthio) phenyl] A mixture of sulfonium hexafluorophosphate and thiobis-p-phenylene bis(diphenylsulfonium)bis(hexafluorophosphate) "UVI-6992 (trade name, manufactured by Dow Chemical Company)", 5 parts by mass of 1, A negative photoresist composition was prepared by mixing 5-dihydroxynaphthalene and 43 parts by mass of γ-butyrolactone.

[0087] The negative photoresist composition was coated on a silicon wafer with a spin coater, and then prebaked at 60° C. for 5 minutes and 90° C. for 5 minutes on a hot plate to obtain an organic film with a film thickness of 30 μm. The organic film was pressed against the organic film at 90° C. for 1 minute using a NM401 Imprinter (manufactured by Ming Chang Kiko Co., Ltd.) under a pressing condition of 200 N. Thereafter, the substrate was cooled to 23° C.,...

Embodiment 2

[0092] A negative electrode substrate was formed in exactly the same manner as in Example 1, except that the negative resist composition used in Example 1 was changed to the following positive resist composition.

[0093] 1 part by mass of [2-(propylsulfonyloxyimino)-2,3-dihydrothiophene-3-ylidene](o-tolyl)acetonitrile (IRGACURE PAG103 (trade name), Ciba Specialty Chemicals (manufactured by Ciba Specialty Chemicals), 40 parts by mass of the resin represented by the following structural formula (z1) that can increase the solubility of alkali by the action of an acid, 60 parts by mass of formaldehyde and an acid catalyst in the presence of The phenolic resin obtained by addition condensation of m-cresol and p-cresol and 1 part by mass of 1,5-dihydroxynaphthalene are uniformly dissolved in propylene glycol monomethyl ether acetate and passed through a filter with a pore size of 1 μm The membrane was filtered to obtain a positive photoresist composition with a solid content mass c...

Embodiment 3

[0103] 100 parts by mass of multifunctional bisphenol A novolac epoxy resin "Epikote 157S70 (trade name, manufactured by Japan Epoxy Resin Co., Ltd.)", 5 parts by mass of diphenyl [4-(phenylthio) phenyl] A mixture of sulfonium hexafluorophosphate and thiodiphenylene bis(diphenylsulfonium)bis(hexafluorophosphate) "UVI-6992 (trade name, manufactured by Dow Chemical Company)", 5 parts by mass of 1, A negative photoresist composition was prepared by mixing 5-dihydroxynaphthalene and 43 parts by mass of γ-butyrolactone.

[0104] The photoresist composition was spin-coated on a silicon wafer, and prebaked at 60° C. for 5 minutes and then at 90° C. for 5 minutes to form an organic film with a film thickness of 30 μm. Using NM401 Imprinter (manufactured by Mingchang Machinery Co., Ltd.), under the pressing condition of 200N, the quartz mold was pressed on the organic film for 5 minutes. Co., Ltd.) irradiate the entire substrate with an ultra-high pressure mercury lamp (exposure amoun...

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Abstract

The invention provides a cathode substrate, a secondary battery using the cathode substrate, a resin compound for forming the cathode substrate and a method for manufacturing the cathode substrate. The cathode substrate may be used to produce batteries having a high output voltage, a high energy density and being superior in charge and discharge cycle characteristics. By means of the cathode substrate (10), a battery having a high output voltage and a high energy density, and being superior in charge and discharge cycle characteristics can be provided, wherein the cathode substrate is characterized in that the cathode substrate is formed by forming a metal film (13) on a support (11) provided with patterned organic film (12) molded by a thermal imprint process or a photoimprint process.

Description

technical field [0001] The present invention relates to a negative electrode substrate, a secondary battery using the negative electrode substrate, a resin composition for forming the negative electrode substrate, and a method for manufacturing the negative electrode substrate. Negative electrode base material of battery excellent in cycle characteristics, secondary battery using the negative electrode base material, resin composition for forming the negative electrode base material, and production method of the negative electrode base material. Background technique [0002] The industry has been vigorously carrying out research and development of batteries with both high output voltage and high energy density. In particular, the industry needs a secondary battery with low internal resistance, less decrease in battery capacity due to charge and discharge, and excellent charge and discharge cycle characteristics. Lithium secondary batteries using, for example, thin-film amor...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01M4/02H01M4/66H01M4/04H01M10/36H01M10/40C08L63/00C08L61/06C08L25/18C08L33/00G03F7/00H01M4/38H01M4/64H01M4/70
CPCY02E60/12Y02T10/7011Y02E60/122Y02E60/10
Inventor 三隅浩一渡边充广本间英夫
Owner TOKYO OHKA KOGYO CO LTD
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