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Optimizing method of high temperature resistant distillery yeast

A technology of alcoholic yeast and optimization methods, applied in the direction of microorganism-based methods, biochemical equipment and methods, and treatment of microorganisms with electricity/wave energy, can solve problems such as long cycle, low temperature tolerance, and single optimization method, and achieve Strong fermentation power, stable performance, and the effect of improving economic benefits

Inactive Publication Date: 2008-12-24
TONGJI UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The purpose of the present invention is to overcome the shortcomings of existing single optimization means, long period, and low temperature tolerance, to provide a new method for optimizing high-temperature-resistant yeast strains, and to provide high-temperature-resistant alcoholic yeast obtained by screening with this method strain

Method used

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  • Optimizing method of high temperature resistant distillery yeast
  • Optimizing method of high temperature resistant distillery yeast
  • Optimizing method of high temperature resistant distillery yeast

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] Example 1 Treatment of Saccharomyces cerevisiae strains with high dose rate pulsed electron beams

[0028] Preparation of irradiated samples: Inoculate the starting strain Saccharomyces cerevisiaewo (purchased from Sigma) into 100ml liquid YPD medium, cultivate at 36°C, activate for 18 hours, then take 0.5ml bacterial solution into EP (eppendorf) tube, centrifuge at 5000r / min, repeated three times. The samples were pretreated by freeze-drying and vacuum-drying at room temperature.

[0029] Set different irradiation doses (0-200Gy) respectively, and measure the survival curve of yeast ( figure 1 ), after the yeast was irradiated and diluted to spread on the plate, the number of colonies in each plate was recorded 24 hours later. The result is as figure 1 As shown, it can be seen from the figure that with the increase of the irradiation dose, the number of yeast colony survival has an overall downward trend, but the decline in the survival curve from 70Gy to 100Gy ten...

Embodiment 2

[0031] High temperature acclimatization of sample after embodiment 2 irradiation

[0032] The four groups of irradiated yeast samples obtained in Example 1 were respectively cultured in YPD liquid medium at 36°C for 4h, then inoculated into 100ml YPD liquid medium respectively, enriched and cultured at 41°C for 48h, diluted and then coated with YPD plate. Cultivate at 41°C, take unirradiated yeast as a control, and record the colony growth every day. And through multiple times of high-temperature acclimatization and screening (that is, culture for three days at a culture temperature of 36°C, pick out well-grown, round and full-bodied colonies, and then culture for three days under the culture conditions that the transfer culture temperature is increased by 0.5°C, repeat the above steps until the temperature is raised to the point where the strain cannot grow.)

[0033] Finally, strains resistant to high temperature 43.5°C, 43°C, 42.5°C, and 42°C were obtained for each group r...

Embodiment 3

[0034] Embodiment 3 repeated experiments

[0035] Adopt the method of embodiment 1 and 2, carry out irradiation time to departure bacterial strain Saccharomyces cerevisiae and be respectively 10s, 12s, 15s, 17s, 20s, 22s, 25s, and irradiation dose rate is respectively 10s 9 Gy / s, 1.2X10 9 Gy / s, 1.5X10 9 Gy / s, 1.7X10 9 Gy / s, 2X10 9 Gy / s, 2.2X10 9 Gy / s and 2.5X10 9 Gy / s irradiation treatment and high temperature acclimatization screening, two groups were set up for each dose rate. As a result, each group could normally grow more than 20 single colonies in the YPD solid medium plate at 41 °C, that is, all of them can obtain high temperature resistance. Strains above 41°C. This shows that the method of the present invention optimizes the high temperature resistance of Saccharomyces cerevisiae, has good repeatability, and can obtain Saccharomyces cerevisiae with high temperature resistance of at least 41°C.

[0036] Example 3 Analysis of ethanol content in the fermentation o...

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Abstract

The invention relates to a method for optimizing high temperature resisting alcohol yeast. Yeast strains are irradiated by high dosage rate pulsed electron beams, and the high temperature resisting yeast strains are obtained after selection by combining the high temperature domestication. The invention also discloses high temperature resisting yeast strains obtained by adopting the selection of the method. The method is adopted to optimize the yeast strain and has good reproducibility. The high temperature resisting yeast strains obtained by the method have stable performance, high activity and strong fermenting force and the industrial use can ensure that the high temperature resisting yeast strains in the alcohol industry can normally grow in summer with high temperature; both the water consumption and the electricity consumption are reduced, and the alcohol yield is increased, thereby bringing evident economic benefits.

Description

technical field [0001] The invention relates to an optimization method of high-temperature-resistant alcoholic yeast and a high-temperature-resistant alcoholic yeast strain obtained by the method. Background technique [0002] Research on high-temperature-resistant alcohol yeast has become a hot topic in the alcohol industry at home and abroad. The use of high-temperature-resistant yeast can not only cooperate with the optimum temperature of cellulase for cellulose raw materials; reduce production water consumption and power consumption, and make full use of existing With equipment, the production cycle can be shortened, productivity can be increased, and normal production in summer can be guaranteed. [0003] Since the late 1980s, high-temperature-resistant alcoholic yeasts have come out successively in my country and have been successfully applied in production. From the end of 1980 to 1985, Beijing Alcohol Factory initially screened out 5 strains with strong fermentation...

Claims

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Application Information

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IPC IPC(8): C12N1/16C12N13/00C12R1/865
Inventor 汪世龙孙晓宇许竞早朱虹朱融融姚思德
Owner TONGJI UNIV
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