Method for manufacturing silicon base body stephanoporate ferrite thin film with hydrotalcite forerunner method
A technology of silicon matrix and hydrotalcite is applied in the field of preparation of silicon matrix porous ferrite film prepared by hydrotalcite precursor method, and achieves the effects of uniform pore size distribution, uniform magnetic domain structure and strong adhesion
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Embodiment 1
[0021] Accurately weigh Mg(NO 3 ) 2 ·6H 2 O, Fe(NO 3 ) 3 9H 2 O, mixed salt solution is prepared with deionized water, and the concentrations of metal ions in the solution are: [Mg 2+ ]=0.2M, [Fe 3+ ]=0.1M, put this mixed solution into a beaker. Immerse the monocrystalline silicon substrate after sulfonation for 5 days in a beaker for 60 minutes, then pour the soaked monocrystalline silicon substrate into a three-neck flask along with the mixed salt solution, and titrate with alkali (NaOH=2M) to pH 9.5. Afterwards, the original slurry and the monocrystalline silicon substrate were quickly transferred to an autoclave with a polytetrafluoroethylene liner, and hydrothermally crystallized at 180° C. for 24 hours. After naturally cooling to room temperature, rinse the monocrystalline silicon substrate repeatedly with deionized water; dry at 70°C for 24 hours, and obtain a hydrotalcite precursor film on the silicon substrate; then heat the film to 700°C at a rate of 2°C / min ...
Embodiment 2
[0023] Accurately weigh Mg(NO 3 ) 2 ·6H 2 O, Fe(NO 3 ) 3 9H 2 O, mixed salt solution is prepared with deionized water, and the concentrations of metal ions in the solution are: [Mg 2+ ]=0.6M, [Fe 3+ ]=0.2M, put this mixed solution into a beaker. A 5-day-sulfonated monocrystalline silicon substrate was immersed in a beaker for 60 minutes. Pour the soaked monocrystalline silicon substrate into a three-necked flask along with the mixed salt solution, and titrate with alkali (NaOH=2M) until the pH is 9.5. Afterwards, the original slurry and the monocrystalline silicon substrate were quickly transferred to an autoclave with a polytetrafluoroethylene liner, and hydrothermally crystallized at 180° C. for 24 hours. After natural cooling to room temperature, rinse the monocrystalline silicon substrate repeatedly with deionized water; dry at 60°C for 12 hours, and obtain a hydrotalcite precursor film on the silicon substrate; then raise the temperature of the film to 900°C at a ...
Embodiment 3
[0025] Accurately weigh Ni(NO 3 ) 2 ·6H 2 O, Fe 2 (SO 4 ) 3 ·XH 2 O, mixed salt solution was prepared with deionized water, and the concentrations of metal ions in the solution were: [Ni 2+ ]=0.2M, [Fe 3+ ]=0.1M, put this mixed solution into a beaker. The 7-day-sulfonated monocrystalline silicon substrate was immersed in a beaker for 70 minutes. Pour the soaked monocrystalline silicon substrate into a three-neck flask along with the mixed salt solution, and titrate with alkali (NaOH=2M) until the pH is 10. Afterwards, the original slurry and the monocrystalline silicon substrate were quickly transferred to an autoclave with a polytetrafluoroethylene liner, and hydrothermally crystallized at 150° C. for 24 hours. After natural cooling to room temperature, rinse the monocrystalline silicon substrate repeatedly with deionized water; dry at 60°C for 12 hours to obtain a hydrotalcite precursor film on the silicon substrate; then heat the film to 500°C at a rate of 5°C / min ...
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