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Pigment -type photosensitive material

A technology of photosensitive materials and pigments, applied in optics, optical components, opto-mechanical equipment, etc., can solve the problems of lowering the thermal cracking temperature of carbon black, unsuitable color filter black matrix, poor heat resistance, etc. Heat resistance and dimensional stability, maintaining color stability, reducing the effect of thermal expansion coefficient

Inactive Publication Date: 2008-08-13
IND TECH RES INST
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  • Abstract
  • Description
  • Claims
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Problems solved by technology

However, if the amine-containing compound is first adsorbed on the pigment surface, it is very likely to affect the stability of the subsequent wet grinding process, or cause the desorption of the amine-based compound during the preparation process to cause aggregation
In addition, the thermal cracking temperature of amine-containing compounds is lower than that of carbon black, so it may reduce the thermal cracking temperature of carbon black, which is not suitable for the black matrix of color filters
[0006] The heat resistance of the above-mentioned pigment surface modification methods is not good, and it is not suitable for the needs of high heat-resistant color photoresists and black matrix materials in color filters. Therefore, the industry is in urgent need of a pigment-type photosensitive material. With high heat resistance and dimensional stability, it can be applied to color filters with high temperature resistance

Method used

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  • Pigment -type photosensitive material
  • Pigment -type photosensitive material

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preparation example Construction

[0031] The preparation method of the pigment-type photosensitive material of the present invention can first disperse the surface-modified pigment with a dispersant, then add alkali-soluble resin, multifunctional monomer, photoinitiator and solvent and mix evenly, and finally add other ingredients Add in, stir well at high speed before use.

[0032] The pigment-type photosensitive material of the present invention can be applied to a color filter as a material for a color photoresist and a black matrix, and the manufacturing steps include coating the color photoresist on a transparent glass substrate by spin coating on, pre-baked at 90°C for about 2 minutes; 2 The ultraviolet light source is exposed with a photomask with a specific pattern, and the exposed part produces a cross-linking reaction; then it is developed with an alkaline aqueous solution, the unexposed part is washed away by the alkali solution, and the pattern of the exposed part is retained; the pattern is washed...

preparation example 1

[0037] In a 250 ml grinding tank, add zirconium balls of 1 mm in diameter to 1 / 2 grinding tank volume, add 100 g of tetrahydrofuran (THF) solvent, then add 40 g of red pigment (pigment red 254, referred to as PR254, purchased from Ciba) and 5 g of inorganic alkanes Oxygen compound modifier 3-aminopropyltriethoxysilane (3-Aminopropyltriethoxysilane), disperse this mixed solution with a red devil grinder for 2 hours, take it out and place it in a 250g round bottom reaction bottle, and then add 1.7g pH The hydrochloric acid aqueous solution of 2.1 is continuously stirred; Then, add 5g inorganic alkoxy compound modifier triethoxymethyl silane (Triethoxymethyl silane, TEOS), this 5g TEOS carries out hydrolysis reaction in hydrochloric acid aqueous solution, stirs at room temperature 24 Hours and after THF volatilized, it was aged at high temperature (110° C.) for 8 hours to complete the condensation reaction, that is, the preparation of the red pigment coated with inorganic alkoxy c...

preparation example 2

[0039] Add 100g THF solvent in the grinding pot of 250 milliliters, then add 40g red pigment (pigment red 254, purchased from Ciba), this mixed solution is dispersed 2 hours with red devil grinder, takes out and is placed in 250g round bottom reaction bottle, Then add 1.7g of hydrochloric acid aqueous solution with a pH value of 2.1 and continue to stir; then, add 5.65g of TEOS, the TEOS is hydrolyzed in aqueous hydrochloric acid, stirred at room temperature for 24 hours and after THF volatilizes, mature at high temperature (110°C) After 8 hours, the condensation reaction is complete, that is, the preparation of the red pigment coated with the inorganic alkoxy condensate is completed.

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Abstract

The invention provides a pigment type sensitive material comprising alkali-soluble resin, a polyfunctional group monomer, a photo-initiation agent, a pigment coated by inorganic alkoxy condensate and a solvent. The invented pigment type sensitive material has a high heat resisting property, dimensional stability and lesser colority variety by coating the pigment surface with inorganic alkoxy condensate and arranging with alkali-soluble resin, a polyfunctional group monomer and a photo-initiation agent, so as to be used to produce color filters for common liquid crystal displays and flexible displays.

Description

technical field [0001] The invention relates to a pigment-type photosensitive material, in particular to a pigment-type photosensitive material with high heat resistance and dimensional stability. Background technique [0002] The color filter of a liquid crystal display usually includes a black photosensitive resin that forms a black frame to prevent light mixing, and a red, green, and blue color photoresist (photoresist) for light filtering. The color photoresist must have Good light penetration and saturation. Traditional color filters use dyes to meet the requirements of high penetration and color saturation. However, the light resistance and heat resistance of dyes are not good. To overcome this problem, the pigment dispersion method of photoresist materials has replaced the dye method as the mainstream. With the development of large-size panels for TVs, the high brightness required increases the panel temperature. In addition, in order to pursue high color saturation ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/028G03F7/027G02B5/23
Inventor 翁锦成黄国栋陈宜见许玉莹
Owner IND TECH RES INST
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