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Chemical processing-free negative graph photosensitive composition suitable for UV-CTP and planographic printing plate manufactured therefor and planographic printing plate manufacture method

A UV-CTP and composition technology, which is applied in the photoplate-making process of the pattern surface, photosensitive materials used in optomechanical equipment, optics, etc., can solve the problems of polluting printing machines, harmfulness, and dirt.

Active Publication Date: 2010-05-12
LUCKY HUAGUANG GRAPHICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

A disadvantage of these plates is their tendency to smudge (i.e. ink the background) and contaminate the printing press
This shortcoming requires cleaning the printing plate with a suitable cleaning agent (ie fountain solution) before printing. Therefore, the addition of diazo compounds and resins is detrimental to the printing plate used for the "no treatment" plate

Method used

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  • Chemical processing-free negative graph photosensitive composition suitable for UV-CTP and planographic printing plate manufactured therefor and planographic printing plate manufacture method
  • Chemical processing-free negative graph photosensitive composition suitable for UV-CTP and planographic printing plate manufactured therefor and planographic printing plate manufacture method
  • Chemical processing-free negative graph photosensitive composition suitable for UV-CTP and planographic printing plate manufactured therefor and planographic printing plate manufacture method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0024] The chemical-free negative photosensitive composition suitable for UV-CTP of the present invention mainly includes the following six components: (1) an unsaturated water-soluble polymer of -(X)-(Y)-(Z)-structure , and (2) a photopolymerizable prepolymer, and (3) a polyfunctional monomer, and (4) one or more photopolymerization initiators, and (5) one or one More than one kind of dyes or pigments, and (6) one or more solvents; wherein, X represents a copolymerization unit containing a sulfonic acid group, and Y represents a branched carboxylic acid copolymerization unit containing two unsaturated double bonds , Z represents an acrylate copolymerized unit containing an unsaturated double bond branch.

[0025]X is selected from vinylsulfonic acid, styrenesulfonic acid, 2-hydroxyl-3-allyloxy-1-propylsulfonic acid, allyloxy Benzenesulfonic acid, 2-acrylamido-2-methylpropylsulfonic acid, isoprenesulfonic acid. X accounts for 10% molar ratio of the copolymer. Y is a branche...

Embodiment 2

[0031] The chemical-free negative photosensitive composition suitable for UV-CTP of the present invention mainly includes the following six components: (1) an unsaturated water-soluble polymer of -(X)-(Y)-(Z)-structure , and (2) a photopolymerizable prepolymer, and (3) a polyfunctional monomer, and (4) one or more photopolymerization initiators, and (5) one or one More than one kind of dyes or pigments, and (6) one or more solvents; wherein, X represents a copolymerization unit containing a sulfonic acid group, and Y represents a branched carboxylic acid copolymerization unit containing two unsaturated double bonds , Z represents an acrylate copolymerized unit containing an unsaturated double bond branch.

[0032] X is selected from vinylsulfonic acid, styrenesulfonic acid, 2-hydroxyl-3-allyloxy-1-propylsulfonic acid, allyloxy Base benzenesulfonic acid, 2-acrylamido-2-methylpropylsulfonic acid, isoprenesulfonic acid. X accounts for 15% molar ratio of the copolymer. Y is a bra...

Embodiment 3

[0038] The chemical-free negative photosensitive composition suitable for UV-CTP of the present invention mainly includes the following six components: (1) an unsaturated water-soluble polymer of -(X)-(Y)-(Z)-structure , and (2) a photopolymerizable prepolymer, and (3) a polyfunctional monomer, and (4) one or more photopolymerization initiators, and (5) one or one More than one kind of dyes or pigments, and (6) one or more solvents; wherein, X represents a copolymerization unit containing a sulfonic acid group, and Y represents a branched carboxylic acid copolymerization unit containing two unsaturated double bonds , Z represents an acrylate copolymerized unit containing an unsaturated double bond branch.

[0039] X is selected from vinylsulfonic acid, styrenesulfonic acid, 2-hydroxyl-3-allyloxy-1-propylsulfonic acid, allyloxy Benzenesulfonic acid, 2-acrylamido-2-methylpropylsulfonic acid, isoprenesulfonic acid. X accounts for 20% molar ratio of the copolymer. Y is a branch...

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Abstract

The present invention discloses a chemical treatment free negative photosensitive component suitable for UV-CTP and a lithograph plate using the same as well as lithograph plate manufacturing method,mainly comprising: (1) an unsaturated water-soluble polymer in a -(X)-(Y)-(Z)- structure which is characterized in that: X represents a copolymerized unit of sulfonic group; Y represents a carboxylicacid copolymerized unit of a branched chain containing two unsaturated double bonds; Z represents a acrylate copolymerized unit of a branched chain containing an unsaturated double bond; as well as (2) a photopolymerisable prepolymer, (3) a polyfunctional monomer, (4) one or more than one species of photopolymerization initiators and (5) one or more than one species of dyes or pigments. The present invention is suitable for the lithograph plate of UV-CTP plate-making machines. The lithograph plate of the present invention is high in photosensibility and good in network node reducibility, can be directly washed by tap water after ultraviolet light source exposure or can be used on machines for printing without any washing-processing step, and can gain high printing resistance, which is especially suitable for UV-CTP plate-making machines.

Description

technical field [0001] The invention relates to a chemical-free negative photosensitive composition suitable for UV-CTP, a lithographic plate made by using it, and a method for making the lithographic plate. Background technique [0002] The preparation of lithographic printing plates is well known in the printing industry. The plate-making process of the lithographic plate requires at least two steps to complete. One is to expose the plate coated with the photosensitive composition to a specific light source through a mask (such as a positive film type and a negative film type mask), thereby forming One is the latent image of the light image; the other is to carry out a so-called subsequent development step on the exposed printing plate, through which the excess coating is removed. Pre-coated photosensitive lithography is a sheet-like material supported by aluminum or polyester, and can be prepared through the above two steps to have both lipophilic and hydrophilic surface...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/027G03F7/004G03F7/09
Inventor 杨青海孙建军景文盘时燕来王群英宋小伟
Owner LUCKY HUAGUANG GRAPHICS
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