Sub-wavelength continuous surface micro-structure preparation method based on negative refractive rate lens

Abstract

A preparation method of sub-wavelength continuous surface microstructure based on negative refractive index lens: (1) quantify and decompose the target structure, and make a half-tone photolithography mask with graphic feature size on the order of nanometers; (2) The surface of the sheet is coated with photoresist, and then a spacer layer is coated on the surface of the photoresist substrate, and then a metal layer with a thickness of about 10nm-120nm is evaporated on the surface of the spacer layer; (3) a spacer layer is coated on the surface of the metal layer, The prepared halftone photolithographic mask is tightly pressed on the surface of the gap layer; (4) the incident light is vertically irradiated on the surface of the halftone mask to realize the exposure of the photoresist; (5) after the exposure is completed, the gap layer and the metal layer, and develop the photoresist to obtain the desired continuous planar structure. The invention realizes the preparation of the sub-wavelength continuous surface structure, and can be widely used in the preparation of various new functional devices based on surface plasmons.

Description

technical field [0001] The invention belongs to the technical field of micro-nano structure processing, in particular to a method for preparing a sub-wavelength continuous surface microstructure based on a negative refractive index lens. Background technique [0002] In recent years, with the rapid development of micro-nano processing technology and nanomaterials, the electromagnetic properties of micro-nano metal structures are receiving more and more attention. The interaction of light with surface micro-nano metal structures produces a series of new and exotic physical phenomena. For example, in 1998, French scientist Ebbesen and his collaborators discovered the phenomenon of extraordinary enhancement (Extraordinary Optical Transmission) of light passing through a subwavelength metal hole array. The research of H.J.Lezec et al. further showed that: when the light passes through the sub-wavelength metal nanohole, its transmittance can not only be enhanced, but also the di...

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Problems solved by technology

[0004] The technical problem to be solved in the present invention is to provide a method for preparing a sub-wavelength continuous surface microstructure based on a negative refractive index lens in view of the fact that the processing range of the existing continuous surface microstructure preparation technology is difficult to expand to the sub-wavelength scale , the method realizes the subwavelength continuous surface structure forming

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