Diamond covered substrate, filtration filter, and electrode
A technology for covering substrates and diamonds, applied in the direction of electrodes, filtration separation, electrode shape/type, etc., can solve the problems of substrate corrosion, poor electrolysis efficiency, and inability to continue electrolysis, and achieve the effect of reducing stress and preventing corrosion.
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Embodiment 1
[0040] Using the substrates shown in Table 1, a conductive diamond layer was formed. The diameter of the open pores of the substrate is about 1 μm. Scratch treatment is performed using diamond powder as pretreatment, or ultrasonic treatment is performed in a solution in which diamond powder is dispersed. Change the size of the diamond powder to 0.2 μm to 3.0 μm.
[0041] In the synthesis by the hot wire CVD method, the gas pressure was set to 60 Torr, the flow rate of hydrogen was set to 3000 sccm, and the flow rate of methane was set to a range of 0.5 to 5.0 sccm. In addition, diborane gas was used as a boron source. The flow rate is supplied at a concentration in the range of 0.2 to 1.0% relative to methane. The temperature of the substrate was set at 700 to 1000°C. In addition, in the case of the microwave CVD method, the microwave frequency was set to 2.4 GHz, and the microwave output was set to 5 kW. The content of boron is in the range of 10ppm~10000ppm.
[0042] A...
Embodiment 2
[0047] As shown in Table 2, conductive diamond films were formed on porous substrates with varying pore diameters. The prepared diamond is used to cover the substrate, the solution is supplied from one side of the substrate, and the solution is sent to the opposite side using a pump to circulate the solution. A solution obtained by mixing an organic mixed solution containing trichlorethylene and acetone and a slurry-like precipitate containing diamond powder in a 0.1 M sulfuric acid solution was used. Electrochemical oxidation treatment is performed simultaneously with the filtration treatment of this solution. First, the solution was circulated and filtered for 4 hours.
[0048] Table 2
[0049] No.
[0050] In No. 2-1, the maximum value of the open pore diameter was less than 0.1 μm, and the porous substrate was clogged by diamond during diamond film formation, so that the solution could not flow through. As shown in Nos. 2-2 and 2-3, when the diameter of the op...
Embodiment 3
[0052] As shown in Table 3, conductive diamond films were formed on porous substrates with different substrate materials. Electrochemical oxidation treatment was performed in the same manner as in Example 1. When the corrosion of the substrate occurred during the treatment, it was indicated by x, and when it did not occur, it was indicated by ◯. In addition, the current density is further set to 1.5A / cm 2 And continue to carry out electrochemical oxidation treatment for 100 hours (referred to as electrolytic treatment 2). When peeling occurred between the substrate and the diamond film, it was indicated as x, and when it did not occur, it was indicated as ◯.
[0053] table 3
[0054] No.
[0055] The substrate materials of No. 3-1 to 3-6 can be stably processed even when electrochemical oxidation treatment is performed. In the other Nos. 3-7 and 3-8, the electroconductive diamond layer was not covered, corrosion occurred at the part of the substrate directly in c...
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