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Film photoetching manufacturing method of plasma display plate electrode and its product

A plasma and manufacturing method technology, which is applied in the manufacture of electrode systems, the manufacture of discharge tubes/lamps, and the manufacture of cold cathodes, etc., can solve the problems of electrode line defects, bubble amplification, defect point multiplication, etc., and achieves low manufacturing difficulty and cost. , Improve the quality and reduce the effect of defect points

Inactive Publication Date: 2007-10-03
NANJING HUAXIAN HIGH TECH CO LTD
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Problems solved by technology

[0011] The purpose of the present invention is to aim at the process of preparing metal electrodes by thin-film photolithography technology. The hot-press photosensitive dry film process tends to leave bubbles between the photosensitive dry film and the substrate, and these bubbles not only easily bring defects to the electrode wires, but more seriously In contact exposure, these bubbles will be enlarged under negative pressure, thereby multiplying defect points and other problems. Inventing a plasma display panel electrode that can reduce the impact of residual bubbles between the photosensitive dry film and the substrate on the quality of the substrate Thin film photolithography manufacturing method and products thereof

Method used

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  • Film photoetching manufacturing method of plasma display plate electrode and its product
  • Film photoetching manufacturing method of plasma display plate electrode and its product

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Embodiment Construction

[0034] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.

[0035] A thin-film photolithographic manufacturing method for electrodes of a plasma display panel, comprising a front substrate electrode group and a rear substrate electrode group, which are all sequentially manufactured by the following steps:

[0036] (1) Evaporation of thin film electrodes; the process conditions and work steps of this step are the same as those of the prior art;

[0037] (2) coating of photosensitive material (adopting dry film hot pressing to carry out); The technological condition of this step and work step are identical with prior art, and dry film hot pressing wherein is meant that photosensitive material is made into the dry film of uniform thickness, Then place the dry film between the substrate and the hot pressing roller, and make the substrate pass through the hot pressing roller to press the dry film on the substrate;

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Abstract

The present invention relates to a film photo-engraving process to prepare plasma display panel electrode and its product. Said preparation method is characterized by that said method can reduce the residual bubble between photosensitive dry film and baseplate and utilize film metal electrode to prepare plasma display panel electrode by adopting photo-engraving process, after said photo-engraving process a secondary hot-pressing film-drying process is added.

Description

technical field [0001] The present invention relates to a method for manufacturing an electrode for a plasma display panel and a plasma display panel using the electrode obtained by the method, especially a plasma display panel based on a thin film metal electrode, specifically a plasma display panel Electrode thin film photolithographic manufacturing method and its products. Background technique [0002] Currently, a conventional plasma display panel consists of a front panel and a rear panel. The front plate is mainly composed of a substrate glass substrate, an electrode group (including scan electrodes and sustain electrodes), a dielectric layer, and a protective film. The rear plate is mainly composed of a substrate glass substrate, an electrode group, a dielectric layer, a barrier, and the like. [0003] In a conventional plasma display panel, there are usually two possibilities for the electrode group of the front panel, one is a composite electrode composed of a tra...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01J9/02H01J17/49G03F7/00G03F7/16G03F7/20G03F7/26G03F7/40
Inventor 樊兆雯张浩康李青张雄朱立锋王保平
Owner NANJING HUAXIAN HIGH TECH CO LTD
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