Photoelectron characteristic detecting method for thin-layer microcrystal medium material and device thereof
A technology of dielectric materials and detection methods, applied in the direction of measurement devices, analytical materials, material excitation analysis, etc., can solve the problem of inability to distinguish different photogenerated carriers - free and shallow bound photoelectrons, unable to capture photogenerated carrier time signals, etc. question
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[0026] The method for detecting optoelectronic properties of microcrystalline dielectric thin-layer materials includes an ultrashort pulse laser irradiation part 1 , a microwave phase-sensitive detection part 2 and a data acquisition and processing part 3 . The laser irradiation part 1 generates ultrashort pulse (35ps) laser 22, which is irradiated on the sample 21 standing sideways in the microwave resonator 5 through the light inlet 25, causing the dielectric function of the thin layer material (ε=ε′+iε″ ), the change of the real part ε' and the imaginary part ε" of the material dielectric function changes the properties of the microwave in the microwave resonator. The change of the imaginary part of the dielectric function leads to the absorption of the microwave field in the microwave resonant air by the thin layer dielectric material, and the absorbed microwave power is:
[0027] ΔP=ΔV·E 2 σ=ΔV·eμE 2 no 自由
[0028]where E is the microwave field strength, ΔV is the sam...
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