Raster and light valve array processed by electric microcomputer for laser filmsetting and its production

A technology of grating light valve and processing method, which is applied in the direction of diffraction grating, optical mechanical equipment, phototypesetting device, etc., can solve the problems of low scanning precision and slow scanning speed of laser phototypesetting system, and achieve high imaging precision, reduced volume, The effect of increasing the scanning speed

Inactive Publication Date: 2009-09-23
ZHEJIANG UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] In order to solve the problems of slow scanning speed and low scanning precision in the laser phototypesetting system, the present invention proposes a micro-electromechanical processing grating light valve array and its method for laser phototypesetting

Method used

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  • Raster and light valve array processed by electric microcomputer for laser filmsetting and its production
  • Raster and light valve array processed by electric microcomputer for laser filmsetting and its production
  • Raster and light valve array processed by electric microcomputer for laser filmsetting and its production

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Embodiment

[0066] 1) Growing a silicon dioxide layer and a silicon sacrificial layer on the silicon substrate, growing a layer of silicon nitride, single crystal silicon or polycrystalline silicon on the surface of the silicon sacrificial layer, the thickness of the silicon substrate is 300 microns, and the thickness of the silicon dioxide layer is 0.7 Micron, the thickness of the silicon sacrificial layer is 1 micron, and the thickness of silicon nitride, monocrystalline silicon or polycrystalline silicon is 170 nanometers;

[0067] 2) Spray a layer of photoresist on the surface of silicon nitride, single crystal silicon or polycrystalline silicon with a uniform machine, and place the mask plate with the pattern engraved on the photoresist layer under the exposure machine for exposure treatment ;

[0068] 3) After the exposure treatment, a developing operation is carried out in a dark room to remove the photoresist on the exposed part, and the remaining photoresist is used as a protecti...

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Abstract

The invention discloses a microelectromechanical processing grating light valve array and a method thereof for laser phototypesetting. The grating light valve array includes a silicon substrate, a silicon dioxide layer is arranged on the silicon substrate, fixed grating strips and movable grating strips are arranged in parallel at equal intervals on the silicon dioxide layer, and the movable grating strip is in the shape of a bridge suspended in the middle. Both ends of the movable grating bar are fixed on silicon dioxide. The method is to use silicon as the substrate, and then grow a silicon dioxide and silicon sacrificial layer on it. On the sacrificial layer, grow silicon nitride, single crystal silicon or polycrystalline silicon as a cantilever beam, use ion etching process to etch silicon nitride, single crystal silicon or polycrystalline silicon, then use chemical etching to hollow out the sacrificial layer, and finally evaporate Metal aluminum, platinum or metal silver is used as the reflective surface and the upper electrode. The invention is used as a laser scanning control device in a laser phototypesetting system. The device can realize multi-channel parallel scanning on the laser phototypesetting system, which greatly improves the film printing speed of the laser phototypesetting machine.

Description

technical field [0001] The invention relates to a microelectromechanical processing grating light valve array and a method thereof for laser phototypesetting. Background technique [0002] Laser phototypesetting machines and laser direct plate-making machines are important equipment used in the printing industry. At present, most of the domestic phototypesetting machines adopt the first-generation technology, that is, the scanning technology of the acousto-optic modulator. Due to the limitation of the frequency response bandwidth of the modulator, scanning The number of channels is limited; at the same time, the printing industry is currently transitioning from laser phototypesetters to direct plate-making machines. The scanning laser light intensity in direct-plate-making machines is relatively high, and the use of acousto-optic modulator technology cannot meet the requirements for light energy in direct plate-making. At the same time, due to the limitation of the response ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B41B21/08G02B26/10G02B5/18G03F7/00
Inventor 张巍侯昌伦杨国光
Owner ZHEJIANG UNIV
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